Dielectric Properties of Composite Diamond Films

莘海维,凌行,奚正蕾,张志明,沈荷生,戴永兵
DOI: https://doi.org/10.3321/j.issn:1006-2467.2002.05.026
2002-01-01
Shanghai Jiaotong Daxue Xuebao/Journal of Shanghai Jiaotong University
Abstract:The composite diamond films were prepared using a hot filament chemical vapor deposition reactor. The morphology and structure of the composite films were evaluated using scanning electron microscopy (SEM), atomic force microscopy (AFM) and Raman spectroscopy. The result shows that the composite film consists of conventional polycrystalline diamond layers and nanocrystalline diamond layers. The field dependence of the conduction and the frequency dependence of the dielectric loss in the composite diamond films were studied. The result shows that the surface of composite film is very smooth, and the dielectric properties are close to the conventional polycrystalline diamond films. It possesses superior properties of the conventional and nanocrystalline diamond films, and can be applied to the fabrication of diamond semiconductor devices.
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