Preparation and Characterization of Ultrananocrystalline Diamond Films in H 2 /ar/ch 4 Gas Mixtures System with Novel Filament Structure

Jie Feng,Sha-sha Li,Hao Luo,Qiu-ping Wei,Bing Wang,Jian-guo Li,Dong-ping Hu,Jun Mei,Zhi-ming Yu
DOI: https://doi.org/10.1007/s11771-015-2955-2
2015-01-01
Abstract:Diamond films were prepared by hot filament chemical vapor deposition(HFCVD) in a gas mixtures system of methane, argon and hydrogen. The composition and morphology in different deposition pressures and filament structures were investigated, as well as the friction and wear-resistant properties. The sp3-bonded content was measured and nano-mechanics properties were also tested. Results of atomic force microscopy and X-ray photoelectron spectroscopy show that the diamond films whose surface roughness is less than 10 nm and sp3-bonded content is greater than 70% can be prepared by bistratal filament structure with optimized proportion of Ar. It is also shown that the friction coefficient of diamond films is 0.13 and its wear-resistant property is excellent. Nano-mechanics of films shows that its elastic modulus is up to 650 MPa and hardness can reach higher than 60 GPa. The diamond films with excellent performance have a broad application prospect in microelectromechanical systems(MEMS).
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