Abstract:The influences of substrate bias on the properties of carbon nitride thin films, prepared by plasma assisted pulsed laser deposition, are reported. We demonstrated the feasibility of preparation of carbon nitride thin films containing high nitrogen content. A reactive nitrogen plasma was provided by electron cyclotron resonance (ECR) microwave discharge in nitrogen gas. Target ablation and film preparation were performed in the nitrogen plasma environment, with the growing films being concurrently bombarded by the low-energy nitrogen plasma stream. Rutherford backscattering spectroscopy, X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy and Raman spectroscopy were used for composition determination and structure analysis. Films consisting homogeneously of carbon and nitrogen were obtained on Si (100) substrates at low temperatures (<80 °C), with nitrogen content over 50 at.% depending on the bias voltage applied to the substrates. Structural analysis reveals that nitrogen and carbon in the films are bonded through hybridized sp2 and sp3 configurations and the prepared films can be considered as a compound containing amorphous carbon phase, N-bonded sp2 and sp3 hybridized carbon. Besides the composition dependence on the substrate bias voltage, strong influences of the bias voltage on deposition rate and bonding configuration was also observed. The large amount of highly activated nitrogen species created by ECR discharge is expected to be responsible for efficient nitrogen incorporation, bonding formation and film growth. The subsequent surface reactions promoted by the energetic active nitrogen plasma stream enhance the growth of carbon nitride films, while excessive bombardment of the growing film by the plasma stream with higher energies was observed to decrease nitrogen content and deposition rate due to re-sputtering effect.

Structure, mechanical and tribological properties of carbon nitride thin films

Structure and tribological properties of carbon nitride films obtained by the reactive ionized cluster beam method

Structural And Tribological Characteristics Of Carbon Nitride Films Deposited By The Reactive Ionized-Cluster Beam Technique

Structure and properties of carbon nitride films synthesized by low energy ion bombardment

Optical & Electronic Properties of Carbon Nitride Thin Films

Synthesis, composition, surface roughness and mechanical properties of thin nitrogenated carbon films

Chemical Bonding, Structure, And Hardness Of Carbon Nitride Thin Films

Investigation of carbon nitride films by cathodic arc evaporation

Microstructure, Mechanical, and Tribological Properties of CN X Thin Films Prepared by Reactive Magnetron Sputtering

Electronic and Mechanical-Properties of Carbon Nitride Films Prepared by Laser-Ablation Graphite under Nitrogen Ion-Beam Bombardment

Microstructure and Mechanical Properties of Carbon Nitride Multilayer Films Deposited by DC Magnetron Sputtering

Structures and bonding properties of carbon nitride films prepared by radio frequency magnetron sputtering

Annealing Effect On The Microstructure Modification And Tribological Properties Of Amorphous Carbon Nitride Films

Effects of Negative Bias on the Structural, Topological and Tribological Properties of Amorphous Carbon Films Prepared by Magnetron Sputtering

Optimizing hardness of CN x thin films by dc magnetron sputtering and a statistical approach

Microstructure, mechanical and tribological properties of Ti–B–C–N films prepared by reactive magnetron sputtering

Influences of substrate bias on the composition and structure of carbon nitride thin films prepared by ECR-plasma assisted pulsed laser deposition

Effects of Substrate Bias on Structure and Mechanical Properties of (alcrnbsitiv)n Coatings

Carbon Nitride Films Synthesized By Combined Ion-Beam And Laser-Ablation Processing

The Structure, Surface Topography and Mechanical Properties of Si–C–N Films Fabricated by RF and DC Magnetron Sputtering

Effects of Nitrogen Content on Microstructures and Mechanical Behavior of (titacrmonb)nx Films