Tribological Properties of Ta‐C‐N and Ta‐N Thin Films

X. H. Yan,J. Yin,X. N. Cheng,J. Q. Liu
DOI: https://doi.org/10.1002/mawe.201300985
2013-01-01
Materialwissenschaft und Werkstofftechnik
Abstract:The amorphous Ta-C-N and Ta-N thin films were deposited using magnetron sputtering on silicon wafer under the similar condition. The as-prepared thin films were characterized using scanning electron microscope (SEM), optical profiling system, nano-indentation and friction test instruments. The results show that, compared with the Ta-N thin film, the Ta-C-N thin film has higher nano-hardness (9.45 GPa) and elastic modulus (225.71 GPa). Furthermore, the lower friction coefficient and wear rate of the Ta-C-N thin film are 0.238 and 5.94x106 mm3 center dot N1 center dot m1, respectively. The wear surface of Ta-C-N thin film is smoother than that of the Ta-N thin film. Therefore, it shows better anti-wear properties.
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