Annealing Effect On The Microstructure Modification And Tribological Properties Of Amorphous Carbon Nitride Films

Zhou Wang,Chengbing Wang,Qi Wang,Junyan Zhang
DOI: https://doi.org/10.1063/1.2978222
IF: 2.877
2008-01-01
Journal of Applied Physics
Abstract:The influences of thermal annealing on the microstructural and tribological properties of amorphous carbon nitride films were investigated. X-ray photoelectron spectroscopy, Raman spectroscopy, and Fourier transform infrared spectrometer were utilized to characterize bond configuration and chemical state of the films. The results indicated that at low annealing temperatures (200 and 300 degrees C), the volatile species and surface contamination are easily dissociated without obvious bulk modification; while at high annealing temperatures (400 and 500 degrees C), the microstructure of carbon nitride films changed and favored a graphitization process, which indicated the growth of more graphitic film structures. The faint Raman signal of C equivalent to N decreased with annealing temperature (T-A) and completely disappeared at T-A of 500 degrees C, indicating that nitrile bonds were thermal unstable under high temperature. Surprisingly, the tribological properties of the films showed a remarkably decreasing in friction coefficient as the T-A increased; it is attributed to the graphitization of carbon nitride films during thermal annealing, which favored transfer film formation between the carbon nitride films and counterface materials. The transfer films benefit the decrease in coefficient of friction. (C) 2008 American Institute of Physics. [DOI: 10.1063/1.2978222]
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