Abstract:Novolac-diazonaphthoquinone positive photoresists are attractive and widely used in semiconductor fabrication because of their high dry etch resistance and the non-swe]ling aqueous base development to provide high resolution [ 1 ] . Our interests in these areas are concentrated on the improvement of sensitivity which is an important subject on the UV sensitive photoresist systems, which are based on the combined principles of chemical amplification and dissolution inhibition[2]. Upon irradiation, a strong protonic acid is generated from the photoacid generator which can, upon a subsequent bake step, catalyze the conversion of the dissolution inhibition to an aqueous base soluble form. One of the cruicial processing steps is the process of photoac.d generation. It is well known that opium cations, especially diaryhodonium and triarylsuiphonium, are useful in the photoinitiation of both radical and cationic polymerizations[3]. On the other hand, in our previous study[4], it was found that p-nitrobenzyl 9,10-dimethoxyanthracene-2-sulphonate photodissoc fates to generate 9,10-dimethoxyanthracene-2-sulphonic acid, and that this dissociation is considered to proceed via an intramolecular electron transfer from the excited singlet state of 9,10-dimethoxyanthracene moiety to p-nitrobenzyl moiety. By combining diphenyliodonium ion as electron acceptor with 9,10-dimethoxyanthracene-2-sulphonic acid as electron donor, we discovered a novel category of diphenyliodonium salt whose eounteranion acts as spectral sensitizer. Herein we report the photochemicall behavior of diphenyliodonium 9,10-dimethoxyanthracene-2-sulphonate(DIAS) associated with photoindueed intramolecular electron transfer within ion-pair, in which counteranion acts as both sensitizer and precursor for photoacid generator, and its application to a positive resist which is based on the combined principles of chemical amplification and dissociation inhibition. DIAS was prepared by the reaction of sodium 9,10-dimethoxyanthracene-

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