SYNTHESIS OF A SELF-CROSSLINKING POLYMER AND ITS APPLICATION IN WATER-DEVELOPABLE,CHEMICALLY AMPLIFIED NEGATIVE PHOTORESIST

Xiaoyin Hong,Defu Hu
2000-01-01
Abstract:A new kind of acid-sensitive polymer with T_g=95℃ and M_n=7*!625, M_w=25*!013 (M_w/M_n=3.28) was synthesized by the co-polymerization of styrene, N-(4-hydroxyphenyl) maleimide and methylacrylamidoglycolate methylether(MAGME). This MAGME containing co-polymer can be self-crosslinked via acid-catalyzed condensation reaction when heated. A new kind of chemically amplified negative photoresist without crosslinking agent was studied using this co-polymer as the base resin, which was developable in harmless NaOH-H_2O solution. Diaryliodonium hexafluorophosphate was used in the photoresist as the photo-acid generator to supply the strong acid and phenothiazine was the photosensitizer. The condition of photolithography was preliminarily investigated.\;
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