A Realizable Green Strategy to Negative Polyurethane Photoresists through the Application of a Silicone Resin Photoinitiator
Wen Liao,Can Xu,Xiang Wu,Ying Xiong,Zhen Li,Hongding Tang
DOI: https://doi.org/10.1021/acsapm.0c01216
2020-12-31
ACS Applied Polymer Materials
Abstract:In order to realize the recycling of negative photoresist materials, four thioxanthone silicone resin photoinitiators (TXSRs) were prepared and used in the preparation of a polyurethane acrylate (PUA) negative photoresist. Their structures were confirmed by 1H NMR, 13C NMR, 29Si NMR, FTIR, and GPC. The photopolymerization kinetics of acrylate monomers initiated by the TXSRs demonstrated their comparative initiating activities to the commercial CQ (camphorquinone)/MDEA (N-methyldiethanolamine) composite. TXSRs are also revealed as a polymer modifier by evidence of the improved properties for the cured films such as better thermal stability, lower surface tension, and enhanced resistance against solvent. Due to their high initiating efficiency and better ethanol resistance of the cured PUA films, a trial pattern experiment of PUA with TXSR-2 as a photoinitiator developed in ethanol was successfully carried out. More importantly, the PUA negative photoresist without light exposure could be recovered and used next time.The Supporting Information is available free of charge at https://pubs.acs.org/doi/10.1021/acsapm.0c01216.Materials, instruments, synthetic procedures, measurements, detailed results including the 1H NMR, 13C NMR, 29Si NMR, and FTIR spectra, solution to determine the average number of the TX moiety, conversion–time curves for polymerization, average conversions with the error bar in the photopolymerization experiments, TGA curves, DSC curves, thermal data, data for surface water droplet morphologies and water contact angles, XPS spectra of the different cured film surfaces, 1H NMR, FTIR, and UV–vis spectra of the original and recovered, and photographs of pattern letters after conducting photolithography experiments by using recovered photoresists for three cycles (PDF)This article has not yet been cited by other publications.
polymer science,materials science, multidisciplinary