A Novel Vinyl Ether Resin of Poly(4-Vinylphenol) Derivative for Lithographic Resist

Jian Zhang,Haixiong Ge
DOI: https://doi.org/10.1109/inec.2008.4585519
2008-01-01
Abstract:Vinyl ether (VE) resins are considered as high reactive monomers which undergo a fast cationic polymerization in the presence of photogenerated protonic acids, so VE-based resins appear to be an attractive alternative to the widely used acrylate resins in UV-curing. To examine the VE resin properties, it is utilized as negative photoresist.
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