Evaluations of KOH Solution As an Effective Developer for Chemical Amplified Resist UVIII

Jinhai Shao,Sichao Zhang,Jianpeng Liu,Yaqi Ma,Bing-Rui Lu,Yan Sun,W. Lu,Nit Taksatorn,Yifang Chen
DOI: https://doi.org/10.1016/j.mee.2014.08.014
IF: 2.3
2014-01-01
Microelectronic Engineering
Abstract:This paper reports our evaluative work on diluted KOH solution as a developer in electron beam lithography (EBL) for the chemically amplified resist UVIII. The EBL performance of UVIII with KOH developer has been systematically assessed and compared with that of the conventional CD26 developer. The contrast curve method is used to characterize both contrasts and sensitivities with various concentrations of KOH in deionized water. It has been demonstrated that the diluted KOH is as good a developer as CD26. However, KOH clearly shows a number of advantages over CD26, including improved cost-effectiveness (1/1000 the cost), more environmentally friendly properties, reduced toxicity and a longer lifetime. The quality of EBL when using KOH as a developer will be detailed in this paper, and the comparison of KOH with CD26 will be discussed. (C) 2014 Elsevier B.V. All rights reserved.
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