Integrated cardiac care.

G. Hallman,C. Edmonds

DOI: https://doi.org/10.1016/0003-4975(95)00681-A

1995-11-01

Abstract:

What problem does this paper attempt to address?

Far-UVC (UV222) Based Photolysis, Photooxidation, and Photoreduction of Chlorophenols Using a KrCl-excimer Lamp: Degradation, Dechlorination, and Detoxification

Yu-Jia Nong,Qian-Yuan Wu,Yun-Peng Wu,Ju-Won Lee,Min-Yong Lee,Wen-Long Wang

DOI: https://doi.org/10.1016/j.watres.2024.122560

IF: 12.8

2024-01-01

Water Research

Abstract:The KrCl-excimer lamp, emitting far-UVC light at 222 nm (UV222), offers a promising alternative to conventional UVC light at 254 nm (UV254) for the photolysis of organic pollutants and the activation of radical sensitizers. This study was aimed to investigate the efficiencies of UV222 in the treatment of halogenated aromatics, focusing on its performance in degradation, dechlorination and detoxification. Chlorophenols, representative recalcitrant and toxic halogenated aromatics, were used as target pollutants. The pathways of direct photolysis, photooxidation and photoreduction under UV222 illumination were compared. UV222 outperformed UV254 in photolyzing chlorophenols (1.4-34.1 times faster), especially protonated chlorophenols, due to substantially higher UV absorption (17.1-108.0 times) and quantum yields (2.1-3.4 times). The quantum yields of chlorophenols were influenced by the inducive electron-withdrawing effect of Cl-substitutes. Moreover, UV222 improved the dechlorination of chlorophenols to 95 % compared to 60 % by UV254. The introduction of radical sensitizer (e.g., H2O2, nitrate, and sulfite) reduced 4-chlorophenol photolysis by competing for UV222 absorption, though the sensitizers partially increased radical oxidation via generating center dot OH or eaq- . UV222 photolysis of 4-chlorophenol increased the toxicity by 88.6 times through forming toxic intermediates (e.g., hydroquinone and resorcinol). Notably, center dot OH and eaq- (i.e., UV222/H2O2 and UV222/sulfite) increased the dechlorination and center dot OH (i. e., UV222/H2O2) detoxified the mixture solution. Moreover, UV222 photolysis remained effective for 4-chlorophenol removal in real paper-mill wastewater, indicating the potential application of KrCl* lamp UV222.
UV 222 nm Emission from KrCl* Excimer Lamps Greatly Improves Advanced Oxidation Performance in Water Treatment

Emma M. Payne,Bryan Liu,Lauren Mullen,Karl G. Linden

DOI: https://doi.org/10.1021/acs.estlett.2c00472

IF: 11.558

2022-08-15

Environmental Science & Technology Letters

Abstract:KrCl* excimer lamps emitting at 222 nm hold potential for enhancing ultraviolet (UV)-based advanced oxidation efficiency. Experiments were conducted in both ultrapure water and groundwater comparing low-pressure UV (LPUV) and KrCl* excimer lamps, with two different radical promoters [hydrogen peroxide (H2O2) and nitrate (NO3 –)]. Compared to that of conventional LPUV/H2O2, the steady-state hydroxyl radical (•OH) concentration achieved in the KrCl*/NO3 – UV/AOP was 13.1 times greater while that for the KrCl*/H2O2 process was 9.4 times greater in ultrapure water; the values in groundwater were 7.3 and 3.7 times greater, respectively, all using a standard single probe compound decay method as a proxy for •OH radical generation. This work identified several research gaps that must be addressed to facilitate adoption of KrCl* for UV/AOP, including development of methods for comparing UV/AOPs that utilize different UV radiation sources and radical promoters, a need to acquire more information about direct photolysis quantum yields at 222 nm for contaminants of concern, and the impact of the background water matrix constituents on radical promotion or formation of any byproducts, especially in the presence of NO3 – as a radical promoter.

environmental sciences,engineering, environmental
Enhanced degradation of emerging contaminants by Far-UVC photolysis of peracetic acid: Synergistic effect and mechanisms

Chen-Yan Hu,Li-Li Hu,Zheng-Yu Dong,Xin-Yu Yang,Hao Liu,Jia-Nan Chen,Ling-Mei Gao

DOI: https://doi.org/10.1016/j.watres.2024.121943

IF: 12.8

2024-06-16

Water Research

Abstract:Krypton chloride (KrCl*) excimer lamps (222 nm) are used as a promising irradiation source to drive ultraviolet-based advanced oxidation processes (UV-AOPs) in water treatment. In this study, the UV 222 /peracetic acid (PAA) process is implemented as a novel UV-AOPs for the degradation of emerging contaminants (ECs) in water. The results demonstrate that UV 222 /PAA process exhibits excellent degradation performance for carbamazepine (CBZ), with a removal rate of 90.8% within 45 min. Notably, the degradation of CBZ in the UV 222 /PAA process (90.8%) was significantly higher than that in the UV 254 /PAA process (15.1%) at the same UV dose. The UV 222 /PAA process exhibits superior electrical energy per order (EE/O) performance while reducing resource consumption associated with the high-energy UV 254 /PAA process. Quenching experiments and electron paramagnetic resonance (EPR) detection confirm that HO• play a dominant role in the reaction. The contributions of direct photolysis, HO•, and other active species (RO• and 1 O 2 ) are estimated to be 5%, 88%, and 7%, respectively. In addition, the effects of Cl − , HCO 3 − , and humic acid (HA) on the degradation of CBZ are evaluated. The presence of relatively low concentrations of Cl − , HCO 3 − , and HA can inhibit CBZ degradation. The UV 222 /PAA oxidation process could also effectively degrade several other ECs (i.e., iohexol, sulfamethoxazole, acetochlor, ibuprofen), indicating the potential application of this process in pollutant removal. These findings will propel the development of the UV 222 /PAA process and provide valuable insights for its application in water treatment.

environmental sciences,engineering, environmental,water resources
Spectroscopic Characteristics and Disinfection Byproduct Formation During UV-assisted Photoelectrochemical Degradation of Humic Acid

Xiaoling Huang,Shuo Wang,Songming Zhu,Zhangying Ye

DOI: https://doi.org/10.1016/j.jclepro.2022.134171

IF: 11.1

2022-01-01

Journal of Cleaner Production

Abstract:UV-assisted photoelectrochemical processes (UV/E) that produce reactive species are extensively used for degrading pollutants in water, such as natural organic matter (NOM). However, the consequence of the chlo-rinated disinfection byproducts (DBPs) from smaller compounds broken down is not clear in the UV/E. In this study, excitation-emission matrices (EEM) and parallel factor analysis (PARAFAC) were applied to determine the products formed during decomposition and the influence of UV/E processes on the formation of DBPs. In comparison with UV photochemical and electrochemical processes, the deterioration rate of NOM in the UV/E process rose by 68.45% and 54.47% in 70 min, while it increased up to 48.85% under the electrochemical process in 23 h. Not only does the reaction time affect the degradation, but the electrolyte concentration and current density also disturb it. The EEM peak locations were 275 nm/495 nm (Component 1), 275 nm/410 nm (Component 2), 230 nm/405 nm (Component 3), and <220 nm/290 nm (Component 4), which were considered to humic acids, hum-like compounds, fulvic acid-like compounds, and aromatic proteins, respectively. C1 and C2 were well relevant to dissolved organic carbon (DOC) and UV254 (r = 0.925-0.963, p < 0.01) and the formation of MCAA, DCAA, and TCAA were strongly interrelated with UV254 and DOC (r =-0.711 to-0.584). The generation of DBPs has a good correlation with C2 (r = - 0.673, p < 0.01). DBPs formation and calculated theoretical cytotoxicity were significantly suppressed by the UV/E process with a higher degradation of NOM. A similar amount of DBPs formation was obtained while 52.6% and 82.90% of the DOC was reduced under the electrochemical process and the UV/E process, indicating that a lower DBPs production and higher degradation efficiency in the UV/E process. It was supposed that the UV/E process could be an alternative for natural organic matter oxidation with properly controlled DBP formation.
Far-UVC Photolysis of Peroxydisulfate for Micropollutant Degradation in Water

Ran Yin,Yuliang Zhang,Yongyi Wang,Jing Zhao,Chii Shang

DOI: https://doi.org/10.1021/acs.est.3c09120

IF: 11.4

2024-03-23

Environmental Science & Technology

Abstract:Increasing radical yields to reduce UV fluence requirement for achieving targeted removal of micropollutants in water would make UV-based advanced oxidation processes (AOPs) less energy demanding in the context of United Nations' Sustainable Development Goals and carbon neutrality. We herein demonstrate that, by switching the UV radiation source from conventional low-pressure UV at 254 nm (UV(254)) to emerging Far-UVC at 222 nm (UV(222)), the fluence-based concentration of HO^(•) in the...

environmental sciences,engineering, environmental
Far-UVC direct photolysis of iohexol and acetochlor: an experimental and mechanism study

Chen-Yan Hu,Li-Li Hu,Tian-Yang Zhang,Xin-Yu Yang,Hao Liu,Jia-Nan Chen,Ling-Mei Gao,Zheng-Yu Dong

DOI: https://doi.org/10.1080/09593330.2024.2432486

IF: 3.475

2024-12-01

Environmental Technology

Abstract:Recently, the emission of 222 nm Far-UVC krypton chloride (KrCl*) excimer lamps, has gained widespread attention in the field of water treatment. This study compared the degradation kinetics of IOX and ACE under UV 222 and UV 254 irradiation. The results demonstrated that UV 222 irradiation exhibited higher efficiency, increasing the removal rates of IOX and ACE from 72.46% and 19.31% to 100%, respectively. Probe experiments and electron paramagnetic resonance (EPR) spectroscopy were used to identify the major active species generated during UV 222 irradiation ([HO•] ss = 2.74 × 10 −13 M). In addition, the effect of pH, pollutant concentration, anions, and natural organic matter (NOM) on the photolysis of IOX and ACE was investigated. The results indicated that IOX and ACE exhibited minimal dependence on pH, and IOX showed low sensitivity to water matrix components. Finally, the electrical energy consumption of the IOX and ACE photolysis by UV 222 and UV 254 irradiation was evaluated. The results revealed that UV 222 irradiation demonstrated superior economic benefits (EE/O UV222/IOX = 0.59951 KWh/L, EE/O UV222/ACE = 0.25443 KWh/L), effectively reducing treatment costs. This study elucidated the photolysis characteristics of IOX and ACE under Far-UVC irradiation, providing a reference for the selection of process conditions in practical applications.

environmental sciences
Photolysis of Chlorine Dioxide under UVA Irradiation: Radical Formation, Application in Treating Micropollutants, Formation of Disinfection Byproducts, and Toxicity under Scenarios Relevant to Potable Reuse and Drinking Water

Yi-Hsueh Chuang,Kai-Lin Wu,Wei-Chun Lin,Hong-Jia Shi

DOI: https://doi.org/10.1021/acs.est.1c05707

2022-01-13

Abstract:Conversion of potable reuse water utilities and drinking water utilities from a low-pressure UV/H2O2 (LPUV/H2O2) advanced oxidation process (AOP) to alternative AOPs in which oxidants can effectively absorb photons and rapidly generate radicals has attracted great interest. Herein, we propose a novel UVA/ClO2 AOP for different water treatment scenarios because of reduced photon absorption by the background matrix and high molar absorptivity for ClO2 at UVA wavelengths. While the photolysis of ClO2 produces •Cl + O2 or •ClO + O(3P) via distinct product channels, we determined the parameters needed to accurately model the loss of oxidants and the formation of byproducts and combined a kinetic model with experimental data to determine quantum yields (Φ). Modeling incorporating the optimized Φ simultaneously predicted oxidant loss and the formation of major products -HOCl, Cl-, and ClO3-. We also systematically investigated the removal of three contaminants exhibiting different radical reactivities, the formation of 35 regulated and unregulated halogenated disinfection byproducts (DBPs), DBP-associated toxicity, and N-acetylcysteine thiol reactivity in synthetic or authentic RO permeates/surface waters treated by different AOPs. The kinetic model developed in this study was used to optimize operating conditions to control undesired products and improve contaminant removal efficiency. The results indicate that UVA/ClO2 can outperform LPUV/H2O2 in terms of electrical energy per order of contaminant degradation, disinfection byproduct formation, and toxicity indices.

environmental sciences,engineering, environmental
UV-based Advanced Oxidation Processes in Photoreactors with Reflective Sleeves

Tan Meng,Xiao Su,Peizhe Sun,Wenjun Sun,Domenico Santoro,Hong Yao,Hui Wang

DOI: https://doi.org/10.1016/j.jclepro.2023.137945

IF: 11.1

2023-01-01

Journal of Cleaner Production

Abstract:UV-based advanced oxidation processes (UV-based AOPs) via photolysis of radical precursor chemicals (RPCs) are among the most effective technologies for eliminating trace organic contaminants in water treatment facilities. However, mathematical discussions on the kinetics and energy consumption for the engineering photoreactor set-up of UV-based AOPs, especially the newly proposed UV-based AOPs (e.g., UV/persulfate, UV/chlorine and UV/chloramine), are scarce. In this study, a photoreactor with reflective sleeves was mathematically characterized and validated using clean and complex water matrices, and approaches for measuring effective light absorbance by RPC (IRPC) and the reflectance of the photoreactor wall (η) were proposed. By applying IRPC and η, and employing geosmin as a model compound, energy optimization of the UV-based AOPs was conducted based on an updated kinetic model. A new equation was derived for UV/H2O2 to obtain the most cost-effective RPC dose regarding EE/O (electric energy required for one order of contaminant removal) (Copt-EE/O). This equation was then successfully extended to other UV-based AOPs (including UV/persulfate, UV/chlorine, and UV/chloramine). The balance between the treatment goals and operational costs was also discussed. Overall, the new concepts and approaches proposed in this study may aid in the energy optimization and reduce RPC consumption of various UV-based AOPs for engineering applications.
Superiority of UV222 radiation by in situ aquatic electrode KrCl excimer in disinfecting waterborne pathogens: Mechanism and efficacy

Ting Li,Yizhan Zhang,Jiaming Gan,Xin Yu,Lei Wang

DOI: https://doi.org/10.1016/j.jhazmat.2023.131292

IF: 13.6

2023-03-29

Journal of Hazardous Materials

Abstract:Microbial safety in water has always been the focus of attention, especially during the COVID-19 pandemic. Development of green, efficient and safe disinfection technology is the key to control the spread of pathogenic microorganisms. Here, an in situ aquatic electrode KrCl excimer radiation with main emission wavelength 222 nm (UV222) was designed and used to disinfect model waterborne virus and bacteria, i.e. phage MS2, E. coli and S. aureus . High inactivation efficacy and diversity of inactivation mechanisms of UV222 were proved by comparision with those of commercial UV254. UV222 could totally inactivate MS2, E. coli and S. aureus with initial concentrations of ∼10 7 PFU or CFU mL −1 within 20, 15, and 36 mJ/cm 2 , respectively. The UV dose required by UV254 to inactivate the same logarithmic pathogenic microorganism is at least twice that of UV222. The protein, genomic and cell membrane irreparable damage contributed to the microbial inactivation by UV222, but UV254 only act on nucleic acid of the target microorganisms. We found that UV222 damage nucleic acid with almost the same or even higher efficacy with UV254. In addition, free base damage of UV222 in similar ways with UV254(dimer and hydrate). But due to the quantum yield of free base degradation of UV222 was greater than UV254, the photolysis rates of UV222 to A, G, C and U four bases were 11.5, 1.2, 3.2 and 1 times as those of UV254, respectively. Excellent disinfection performance in UV222 irradiation was also achieved in real water matrices (WWTP and Lake). In addition, it was proved that coexisting HCO 3 - or HPO 4 2 – in real and synthetic water matrices can produce • OH to promote UV222 disinfection. This study provided novel insight into the UV222 disinfection process and demonstrated its possibility to take place of the conventional ultraviolet mercury lamp in water purification.

environmental sciences,engineering, environmental
Promotive effects of vacuum-UV/UV (185/254 nm) light on elimination of recalcitrant trace organic contaminants by UV-AOPs during wastewater treatment and reclamation: A review

Yi-Lin Zhang,Wen-Long Wang,Min-Yong Lee,Zheng-Wei Yang,Qian-Yuan Wu,Nan Huang,Hong-Ying Hu

DOI: https://doi.org/10.1016/j.scitotenv.2021.151776

2022-04-01

Abstract:The use of vacuum-UV/UV (185/254 nm) for trace organic contaminants (TOrCs) elimination during wastewater treatments has attracted much attention. Advanced oxidation processes which combine VUV/UV and additional oxidants (vacuum-UV/UV-based advanced oxidation processes, VUV/UV-AOPs) provide a promising method for eliminating recalcitrant and toxic TOrCs for wastewater reclamation. Researches in this area are increasing but the promoting effects, mechanisms, and influencing factors have not been well summarized. A comprehensive discussion of the limitations of this technique and future research directions is needed. VUV/UV-AOPs have considerable synergistic effects by increasing usage of VUV/UV photons and the oxidant, which increases radical generation. In terms of elimination kinetics, VUV/UV-AOPs outperform conventional UV-AOPs and VUV/UV processes in most cases; a 1.2-87.7-fold increase of the fluence-based kinetic constant is achieved. In terms of energy efficiency per order (EE/O) of TOrCs elimination, the EE/O of VUV/UV-AOPs only accounts for 4% of UV-AOPs and 63% of VUV/UV. However, VUV/UV-AOPs still need to be further investigated. Firstly, although VUV and UV processes have similar radical formation pathways, limited information is available on the quantum yields of photolysis and radical formation of oxidants under VUV irradiation. Secondly, optimization of VUV/UV-AOPs operating conditions, especially oxidant dosage and water-flow patterns, is needed. Thirdly, VUV/UV-AOPs are significantly inhibited by organic and inorganic matters, but the mechanisms of inhibition on VUV/UV scattering, radical quenching, and radical conversion are not well understood. Such inhibition suggests that the use of VUV/UV-AOPs would be limited to relatively clear water treatment, e.g., reverse osmosis effluent for potable water reuse and ultrapure water production. Related research is needed to establish a clearer scheme for VUV/UV-AOPs in terms of the spatial distribution of radical species in the VUV/UV irradiation system and the relevant optimization method for promoting oxidation performance.

environmental sciences
Assessing the Chemical-Free Oxidation of Trace Organic Chemicals by VUV/UV As an Alternative to Conventional UV/H2O2.

Wen-Long Wang,Zi-Bo Jing,Yi-Lin Zhang,Qian-Yuan Wu,Jorg E. Drewes,Min-Yong Lee,Uwe Huebner

DOI: https://doi.org/10.1021/acs.est.3c08414

IF: 11.4

2024-01-01

Environmental Science & Technology

Abstract:Low-pressure mercury lamps with high-purity quartz can emit both vacuum-UV (VUV, 185 nm) and UV (254 nm) and are commercially available and promising for eliminating recalcitrant organic pollutants. The feasibility of VUV/UV as a chemical-free oxidation process was verified and quantitatively assessed by the concept of H2O2 equivalence (EQH2O2), at which UV/H2O2 showed the same performance as VUV/UV for the degradation of trace organic contaminants (TOrCs). Although VUV showed superior H2O activation and oxidation performance, its performance highly varied as a function of light path length (Lp) in water, while that of UV/H2O2 proportionally decreased with decreasing H2O2 dose regardless of Lp. On increasing Lp from 1.0 to 3.0 cm, the EQH2O2 of VUV/UV decreased from 0.81 to 0.22 mM H2O2. Chloride and nitrate hardly influenced UV/H2O2, but they dramatically inhibited VUV/UV. The competitive absorbance of VUV by chloride and nitrate was verified as the main reason. The inhibitory effect was partially compensated by •OH formation from the propagation reactions of chloride or nitrate VUV photolysis, which was verified by kinetic modeling in Kintecus. In water with an Lp of 2.0 cm, the EQH2O2 of VUV/UV decreased from 0.43 to 0.17 mM (60.8% decrease) on increasing the chloride concentration from 0 to 15 mM and to 0.20 mM (53.5% decrease) at 4 mM nitrate. The results of this study provide a comprehensive understanding of VUV/UV oxidation in comparison to UV/H2O2, which underscores the suitability and efficiency of chemical-free oxidation with VUV/UV.
VUV/UV/Chlorine As an Enhanced Advanced Oxidation Process for Organic Pollutant Removal from Water: Assessment with a Novel Mini-Fluidic VUV/UV Photoreaction System (MVPS).

Mengkai Li,Zhimin Qiang,Pin Hou,James R. Bolton,Jiuhui Qu,Peng Li,Chen Wang

DOI: https://doi.org/10.1021/acs.est.6b00133

IF: 11.4

2016-01-01

Environmental Science & Technology

Abstract:Vacuum ultraviolet (VUV) and ultraviolet (UV)/chlorine processes are regarded as two of many advanced oxidation processes (AOPs). Because of the similar cost of VUV/UV and UV lamps, a combination of VUV and UV/chlorine (i.e., VUV/UV/chlorine) may enhance the removal of organic pollutants in water but without any additional power input. In this paper, a mini-fluidic VUV/UV photoreaction system (MVPS) was developed for bench-scale experiments, which could emit both VUV (185 nm) and UV (254 nm) or solely UV beams with a nearly identical UV photon fluence. The photon fluence rates of UV and VUV output by the MVPS were determined to be 8.88 × 10(-4) and 4.93 × 10(-5) einstein m(-2) s(-1), respectively. The VUV/UV/chlorine process exhibited a strong enhancement concerning the degradation of methylene blue (MB, a model organic pollutant) as compared to the total performance of the VUV/UV and UV/chlorine processes, although the photon fluence of the VUV only accounted for 5.6% of that of the UV. An acidic pH favored MB degradation by the VUV/UV/chlorine process. The synergistic mechanism of the VUV/UV/chlorine process was mainly ascribed to the effective use of (•)OH for pollutant removal through formation of longer-lived secondary radicals (e.g., (•)OCl). This study demonstrates that the new VUV/UV/chlorine process, as an enhanced AOP, can be applied as a highly effective and energy-saving technology for small-scale water and wastewater treatment.
Matching periodate peak absorbance by far UVC at 222 nm promotes the degradation of micropollutants and energy efficiency

Tao Yang,Ge Zeng,Maoju Jiang,Peng Su,Chenlong Liu,Qixiao Lv,Wenqi Li,Xiangyang Hou,Juan Li

DOI: https://doi.org/10.1016/j.jhazmat.2024.134978

IF: 13.6

2024-06-21

Journal of Hazardous Materials

Abstract:Periodate (PI)-based advanced oxidation processes have gained increasing interest. This study for the first time elevates the light-activation capacity of PI by using far UVC at 222 nm (UV 222 /PI) without extra chemical inputs. The effectiveness and the underlying mechanisms of UV 222 /PI for the remediation of micropollutants were studied by selecting atenolol (ATL) as a representative. PI possessed a high molar absorption coefficient of 9480–6120 M −1 cm −1 at 222 nm in the pH range of 5.0–9.0, and it was rapidly decomposed by UV 222 with first-order rate constants of 0.0055 to 0.002 s −1 . ATL and the six other organic compounds were effectively degraded by the UV 222 /PI process under different conditions with the fluence-based rate constants generally two to hundred times higher than by UVA photolysis. Hydroxyl radical and ozone were confirmed as the major contributors to ATL degradation, while direct photolysis also played a role at higher pH or lower PI dosages. Degradation pathways of ATL were proposed including hydroxylation, demethylation, and oxidation. The high energy efficiency of the UV 222 /PI process was also confirmed. This study provides a cost-effective and convenient approach to enhance PI light-response activity for the treatment of micropollutants.

environmental sciences,engineering, environmental
UV-activated permanganate process for micro-organic pollutant degradation: efficiency, mechanism and influencing factors

Miaomiao Ye,Chengzhuo Li,Xiaowei Liu,Lili Wang,Rong Chen

DOI: https://doi.org/10.2166/wst.2021.068

2021-01-01

Abstract:Ultraviolet-activated permanganate (UV/PM) process is a novel advanced oxidation process (AOP), but its application potential remains to be evaluated. This work investigates the degradation of refractory organic pollutant by UV/PM in terms of efficiency, mechanism, and influencing factors. The target compound benzoic acid (BA), which is a micro-organic pollutant and is resistant to PM and UV treatment, can be efficiently degraded by UV/PM. The electron paramagnetic resonance spectra directly supported the formation of hydroxyl radical (HO center dot) and superoxide radical (O-2(center dot-)) from UV photolysis of PM. Competitive kinetics experiments verified that O-2(center dot-) acted as precursor of HO center dot and the good degradation performance of BA was due to the involvement of HO center dot and manganese(V). The rate constants of BA degradation showed a positive linear relationship with PM dosage in the range of 0.5-20 mg center dot L-1, and the degradation process was significantly influenced by solution pH and natural organic matters but insensitive to chloride and bicarbonate at environmentally relevant concentrations. Compared to the typical UV-based AOP UV/hydrogen peroxide, UV/PM is a little inferior, indicating that optimization and enhancement is needed for this process before its possible practical application.
Vacuum-ultraviolet based advanced oxidation and reduction processes for water treatment

Honglong Zhang,Wenjun Sun,Jing Zhang,Jun Ma

DOI: https://doi.org/10.1016/j.jhazmat.2024.134432

IF: 13.6

2024-05-01

Journal of Hazardous Materials

Abstract:The use of vacuum-ultraviolet (VUV) photolysis in water treatment has been gaining significant interest due to its efficacy in degrading refractory organic contaminants and eliminating oxyanions. In recent years, the reactive species driving pollutant decomposition in VUV-based advanced oxidation and reduction processes (VUV-AOPs and VUV-ARPs) have been identified. This review aims to provide a concise overview of VUV photolysis and its advancements in water treatment. We begin with an introduction to VUV irradiation, followed by a summary of the primary reactive species in both VUV-AOPs and VUV-ARPs. We then explore the factors influencing VUV-photolysis in water treatment, including VUV irradiation dose, catalysts or activators, dissolved gases, water matrix components (e.g., DOM and inorganic anions), and solution pH. In VUV-AOPs, the predominant reactive species are hydroxyl radicals ( ̇OH), hydrogen peroxide (H 2 O 2 ), and ozone (O 3 ). Conversely, in VUV-ARPs, the main reactive species are the hydrated electron ( eaq− ) and hydrogen atom ( ̇H). It is worth noting that VUV-based advanced oxidation/reduction processes (VUV-AORPs) can transit between VUV-AOPs and VUV-ARPs based on the externally added chemicals and dissolved gases in the solution. Increase of the VUV irradiation dose and the concentration of catalysts/activators enhances the degradation of contaminants, whereas DOM and inorganic anions inhibit the reaction. The pH influences the redox potential of ̇OH, the speciation of contaminants and activators, and thus the overall performance of the VUV-AOPs. Conversely, an alkaline pH is favored in VUV-ARPs because eaq− predominates at higher pH.

environmental sciences,engineering, environmental
Controlling contaminants using a far-UVC-based advanced oxidation process for potable reuse

Ran Yin,Claire E. Anderson,Jing Zhao,Alexandria B. Boehm,William A. Mitch

DOI: https://doi.org/10.1038/s44221-023-00094-5

2023-06-16

Nature Water

Abstract:Increasing the efficiency of the processing units used to purify municipal wastewater to potable quality would enhance the sustainability of potable reuse. Conventional advanced oxidation processes using 254 nm UV light degrade contaminants by both direct photolysis and reaction with radicals produced by hydrogen peroxide photolysis. Treatment goals include 0.5-log removal of 1,4-dioxane, reducing N -nitrosodimethylamine to <10 ng l −1 and 6-log virus inactivation. Using three potable reuse waters, we demonstrate here that a switch from 254 to 222 nm (far-UVC) achieved all three treatment goals at ~320 mJ cm − 2 UV fluence, which is around four-fold less than is needed at 254 nm. Developing and validating a kinetic model, we determined that the increased energy efficiency arises from a 2.1- to 7.5-fold increase in direct photolysis and a 3.6-fold increase in radical concentrations. Compared with switching to far-UVC wavelengths, alternative efforts to switch from H 2 O 2 to chlorine have been frustrated by the need to increase UV fluence to control N -nitrosodimethylamine.

English Else
Elucidating the performance of UV-based photochemical processes for the removal of trace organic contaminants: Degradation and toxicity evaluation

Arbab Tufail,Jawad Al-Rifai,William E. Price,Jason P. van de Merwe,Frederic D.L. Leusch,Faisal I. Hai

DOI: https://doi.org/10.1016/j.chemosphere.2023.140978

IF: 8.8

2024-01-05

Chemosphere

Abstract:In this study, the performance of standalone ultraviolet (UV) photolysis and UV-based advanced oxidation processes (AOPs), namely, UV/hydrogen peroxide, UV/chlorine, UV/persulphate, and UV/permonosulphate, were investigated for the degradation of 31 trace organic contaminants (TrOCs). Under the tested conditions, standalone UV photolysis did not achieve effective removal of TrOCs. To improve the degradation efficiency of UV photolysis, four different oxidants were added individually to the test solution. The effect of these oxidants in the absence of UV irradiation was also explored and only chlorine showed promising degradation of some contaminants. During the chlorination of 31 investigated TrOCs, only six demonstrated greater than 50% degradation. The combined UV-based AOPs demonstrated much improved degradation (ranging from 65 to 100%) depending on TrOC-structure and oxidant concentration. The UV/hydrogen peroxide process showed similar degradation of TrOCs, irrespective of the functional groups ( i.e ., electron withdrawing groups, EWGs and electron donating groups, EDGs) present in their structures. Conversely, the UV/sulphate and UV/chlorine based processes achieved better degradation of the TrOCs with EDGs in their structures. TrOCs degradation improved up to 40% when oxidants concentrations were increased from 0.1 to 1 mM, and further increasing the concentration to 2 mM did not improve degradation. Toxicity evaluation using bioluminescence test (BLT assay) demonstrated that except for UV/hydrogen peroxide, all UV-based AOPs increased the toxicity of the treated effluent, indicating generation of toxic by-products. This study elucidates the performance of four different UV-based AOPs for the removal of commonly detected diverse TrOCs for the first time.

environmental sciences
Assessing the Chemical-Free Oxidation of Trace Organic Chemicals by VUV/UV as an Alternative to Conventional UV/H 2 O 2

Wen-Long Wang,Zi-Bo Jing,Yi-Lin Zhang,Qian-Yuan Wu,Jörg E. Drewes,Min-Yong Lee,Uwe Hübner,Jörg E. Drewes,Uwe Hübner

DOI: https://doi.org/10.1021/acs.est.3c08414

IF: 11.4

2024-03-29

Environmental Science & Technology

Abstract:Low-pressure mercury lamps with high-purity quartz can emit both vacuum-UV (VUV, 185 nm) and UV (254 nm) and are commercially available and promising for eliminating recalcitrant organic pollutants. The feasibility of VUV/UV as a chemical-free oxidation process was verified and quantitatively assessed by the concept of H(2)O(2) equivalence (EQ(H(2)O(2))), at which UV/H(2)O(2) showed the same performance as VUV/UV for the degradation of trace organic contaminants (TOrCs). Although VUV showed...

environmental sciences,engineering, environmental
UV/chlorine advanced oxidation processes for degradation of contaminants in water and wastewater: A comprehensive review

Golnoosh Khajouei,Harry O. Finklea,Lian-Shin Lin

DOI: https://doi.org/10.1016/j.jece.2022.107508

IF: 7.7

2022-06-01

Journal of Environmental Chemical Engineering

Abstract:Advanced oxidation processes (AOPs) have recently gained increasing attention as promising alternatives to conventional water and wastewater treatment technologies. As an AOP, there has been a growing interest in UV/chlorine due to its multiple disinfection modes and ability to maintain chlorine residuals in drinking water distribution systems. Compared to the popular UV/H2O2 AOP treatment process, UV/chlorine AOP possesses several advantages including a higher radical production efficiency and a lower power demand. The process has recently been applied for the degradation of a wide range of natural and synthetic organic as well as inorganic compounds including pharmaceutical and personal care products, natural organic matter, herbicides and insecticides, taste and odor, and different types of water and wastewaters. The focus of the present work is to review and evaluate the efficiency of the UV/chlorine process on the oxidation of these pollutants. A critical overview is provided of the fundamentals of UV/chlorine, controlling factors of the process performance, and a comparison with other UV-based AOPs. The formation of disinfection by-products (DBPs), one of the concerns associated with UV/chlorine treatment, is discussed and strategies to tackle this obstacle are provided for future studies and applications.

engineering, chemical, environmental
Unravelling Molecular Transformation of Dissolved Effluent Organic Matter in UV/H2O2, UV/persulfate, and UV/chlorine Processes Based on FT-ICR-MS Analysis

Bingliang Zhang,Xuening Wang,Zhuoyao Fang,Shu Wang,Chao Shan,Si Wei,Bingcai Pan

DOI: https://doi.org/10.1016/j.watres.2021.117158

IF: 12.8

2021-01-01

Water Research

Abstract:Ultraviolet-based advanced oxidation processes (UV-AOPs) are very promising in advanced treatment of municipal secondary effluents. However, the transformation of dissolved effluent organic matter (dEfOM) in advanced treatment of real wastewater, particularly at molecular level, remains unclear. In this study, Fourier transform ion cyclotron resonance mass spectrometry (FT-ICR-MS) coupled with multiple statistical analysis were performed to better understand the transformation of dEfOM in UV/H2O2, UV/persulfate (UV/PS), and UV/chlorine treatments. An obvious increase in oxygen content of dEfOM was observed after every UV-AOPs treatment, and the detailed oxygenation processes were further uncovered by mass difference analysis based on 24 types of typical reactions. Generally, UV/H2O2 process was subjected to the most oxygenation reactions with the typical tri-hydroxylation one (+3O), whereas di-hydroxylation reaction (+H2O2) was dominant in UV/PS and UV/chlorine processes. Additionally, the three UV-AOPs shared the majority of precursors, and more proportions of unique products were identified for each process. The precursors with lower H/C and higher aromaticity were readily degraded by UV/chlorine over UV/H2O2 and UV/PS, with the products featuring lower molecular weight. Moreover, dEfOM of high aromaticity tended to produce chlorinated byproducts through addition reactions in chlorination and UV/chlorine processes. Among these UV-AOPs, the highest reduction of both acute toxicity and specific UV absorbance at 254 nm (SUVA(254)) was observed for UV/chlorine, implying the potential for UV/chlorine process in advanced treatment of wastewater. In addition, acute toxicity was highly correlated with SUVA(254) and CHOS compounds. This study is believed to help better understand the different fates of dEfOM in real wastewater during UV-AOPs treatment. (C) 2021 Elsevier Ltd. All rights reserved.

Integrated cardiac care.

Far-UVC (UV222) Based Photolysis, Photooxidation, and Photoreduction of Chlorophenols Using a KrCl-excimer Lamp: Degradation, Dechlorination, and Detoxification

UV 222 nm Emission from KrCl* Excimer Lamps Greatly Improves Advanced Oxidation Performance in Water Treatment

Enhanced degradation of emerging contaminants by Far-UVC photolysis of peracetic acid: Synergistic effect and mechanisms

Spectroscopic Characteristics and Disinfection Byproduct Formation During UV-assisted Photoelectrochemical Degradation of Humic Acid

Far-UVC Photolysis of Peroxydisulfate for Micropollutant Degradation in Water

Far-UVC direct photolysis of iohexol and acetochlor: an experimental and mechanism study

Photolysis of Chlorine Dioxide under UVA Irradiation: Radical Formation, Application in Treating Micropollutants, Formation of Disinfection Byproducts, and Toxicity under Scenarios Relevant to Potable Reuse and Drinking Water

UV-based Advanced Oxidation Processes in Photoreactors with Reflective Sleeves

Superiority of UV222 radiation by in situ aquatic electrode KrCl excimer in disinfecting waterborne pathogens: Mechanism and efficacy

Promotive effects of vacuum-UV/UV (185/254 nm) light on elimination of recalcitrant trace organic contaminants by UV-AOPs during wastewater treatment and reclamation: A review

Assessing the Chemical-Free Oxidation of Trace Organic Chemicals by VUV/UV As an Alternative to Conventional UV/H2O2.

VUV/UV/Chlorine As an Enhanced Advanced Oxidation Process for Organic Pollutant Removal from Water: Assessment with a Novel Mini-Fluidic VUV/UV Photoreaction System (MVPS).

Matching periodate peak absorbance by far UVC at 222 nm promotes the degradation of micropollutants and energy efficiency

UV-activated permanganate process for micro-organic pollutant degradation: efficiency, mechanism and influencing factors

Vacuum-ultraviolet based advanced oxidation and reduction processes for water treatment

Controlling contaminants using a far-UVC-based advanced oxidation process for potable reuse

Elucidating the performance of UV-based photochemical processes for the removal of trace organic contaminants: Degradation and toxicity evaluation

Assessing the Chemical-Free Oxidation of Trace Organic Chemicals by VUV/UV as an Alternative to Conventional UV/H 2 O 2

UV/chlorine advanced oxidation processes for degradation of contaminants in water and wastewater: A comprehensive review

Unravelling Molecular Transformation of Dissolved Effluent Organic Matter in UV/H2O2, UV/persulfate, and UV/chlorine Processes Based on FT-ICR-MS Analysis