Abstract:Novolac-diazonaphthoquinone positive photoresists are attractive and widely used in semiconductor fabrication because of their high dry etch resistance and the non-swe]ling aqueous base development to provide high resolution [ 1 ] . Our interests in these areas are concentrated on the improvement of sensitivity which is an important subject on the UV sensitive photoresist systems, which are based on the combined principles of chemical amplification and dissolution inhibition[2]. Upon irradiation, a strong protonic acid is generated from the photoacid generator which can, upon a subsequent bake step, catalyze the conversion of the dissolution inhibition to an aqueous base soluble form. One of the cruicial processing steps is the process of photoac.d generation. It is well known that opium cations, especially diaryhodonium and triarylsuiphonium, are useful in the photoinitiation of both radical and cationic polymerizations[3]. On the other hand, in our previous study[4], it was found that p-nitrobenzyl 9,10-dimethoxyanthracene-2-sulphonate photodissoc fates to generate 9,10-dimethoxyanthracene-2-sulphonic acid, and that this dissociation is considered to proceed via an intramolecular electron transfer from the excited singlet state of 9,10-dimethoxyanthracene moiety to p-nitrobenzyl moiety. By combining diphenyliodonium ion as electron acceptor with 9,10-dimethoxyanthracene-2-sulphonic acid as electron donor, we discovered a novel category of diphenyliodonium salt whose eounteranion acts as spectral sensitizer. Herein we report the photochemicall behavior of diphenyliodonium 9,10-dimethoxyanthracene-2-sulphonate(DIAS) associated with photoindueed intramolecular electron transfer within ion-pair, in which counteranion acts as both sensitizer and precursor for photoacid generator, and its application to a positive resist which is based on the combined principles of chemical amplification and dissociation inhibition. DIAS was prepared by the reaction of sodium 9,10-dimethoxyanthracene-

DISSOLUTION INHIBITION MECHANISMS OF POSITIVE PHOTORESIST BASED ON NOVOLAK-DNQ

LANGMUIR-BLODGETT RESISTS OF DIAZONAPHTHOQUINONE NOVOLAC RESIN PRODUCED BY A NEW CONTINUOUS HORIZONTAL DEPOSITION METHOD

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Image Reversal Techniques with a Water-based Chemical Amplified Photoresist

PHOTO-INDUCED HYDROPHILICITY CONVERSION OF Na-DOPED ZnO THIN FILMS

A Computational Probe into the Dissolution Inhibitation Effect of Diazonaphthoquinone Photoactive Compounds on Positive Tone Photosensitive Polyimides

A NOVEL CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST USING DIPHENYLIODONIUM 9, 10-DIMETHOXYANTHRACENE-2-SULPHONATE AS PHOTOINITIATOR

Diazonaphthoquinone Molecular Glass Photoresists: Patterning without Chemical Amplification

The Synthesis of the High Resolution I Line Novolak Resist

Synthesis of a novel vinyl ether functionalized resin and its application in negative photoresist

Multifunctional POSS‐Based Nano‐Photo‐Initiator for Overcoming the Oxygen Inhibition of Photo‐Polymerization and for Creating Self‐Wrinkled Patterns

Preparation of Water-Soluble Negative Photoresist

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Process Research of Novel UV Nanoimprint Lithography Resist with Enhanced Anti-Sticking Property

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SYNTHESIS OF A SELF-CROSSLINKING POLYMER AND ITS APPLICATION IN WATER-DEVELOPABLE,CHEMICALLY AMPLIFIED NEGATIVE PHOTORESIST

Studies on the Interfacial Etching Reaction of Development-Free Vapor Photolithography