Undoped accumulation-mode Si/SiGe quantum dots
Matthew G. Borselli,Kevin Eng,Richard S. Ross,Thomas M. Hazard,Kevin S. Holabird,Biqin Huang,Andrey A. Kiselev,Peter W. Deelman,Leslie D. Warren,Ivan Milosavljevic,Adele E. Schmitz,Marko Sokolich,Mark F. Gyure,Andrew T. Hunter
DOI: https://doi.org/10.48550/arXiv.1408.0600
2014-08-04
Abstract:We report on a quantum dot device design that combines the low disorder properties of undoped SiGe heterostructure materials with an overlapping gate stack in which each electrostatic gate has a dominant and unique function -- control of individual quantum dot occupancies and of lateral tunneling into and between dots. Control of the tunneling rate between a dot and an electron bath is demonstrated over more than nine orders of magnitude and independently confirmed by direct measurement within the bandwidth of our amplifiers. The inter-dot tunnel coupling at the (0,2)<-->(1,1) charge configuration anti-crossing is directly measured to quantify the control of a single inter-dot tunnel barrier gate. A simple exponential dependence is sufficient to describe each of these tunneling processes as a function of the controlling gate voltage.
Mesoscale and Nanoscale Physics