Phases and Structures of Nanocrystalline Tin Films

DZ WANG,X WANG,GQ YANG,XH LIU,YB JIA,G ZHOU,GF LI
DOI: https://doi.org/10.1063/1.358710
IF: 2.877
1995-01-01
Journal of Applied Physics
Abstract:Nanocrystalline TiN thin films were synthesized by Xe+ ion-beam-enhanced deposition at room temperature. X-ray diffraction was used to study different samples prepared by different energy Xe+ ions. The results indicated that different ion energies can introduce different phases. Two metastable phases (Ti2N) can be formed at higher Xe+ energies than 40 keV. The crystalline phases are dependent on the temperatures in the collision cascades, which are induced by Xe+ ion bombardment with different energies. The films were always composed of nanocrystallites. Therefore a lot of surface and interface structures are in the film. The grain sizes grow with the increase of the bombarding ion energy. The effect is caused by the increase of cascade size and local temperature. The lattice parameters are found to increase with the rise of defect concentration and to decrease with the increase of surface structure. These films often have preferential orientation. The relationship between preferential orientation and process parameters is discussed.
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