Phase Formation in Annealed Sputtered (Fe,ti)-N Films

HY Wang,EY Jiang,P Wu,SL Ming

DOI: https://doi.org/10.1063/1.365098

IF: 2.877

1997-01-01

Journal of Applied Physics

Abstract:(Fe,Ti)–N thin films with titanium concentrations 3–35 at. % were prepared at room temperature by facing targets sputtering. X-ray diffraction and transmission electron microscopic studies were employed to characterize various phases observed prior to and during in situ annealing of (Fe,Ti)–N films. The films with 3–10 at. % Ti contained an α-(Fe,Ti) phase and an α′-martensite phase and the films with 20–35 at. % Ti comprised α-Fe(N), α′-martensite, and TiN phases in the as-deposited samples. The annealing temperature (TA) was increased from RT to 800 °C in increments of 50 °C. Annealing of the samples with 8 at. % Ti showed no structural changes between RT and 300 °C, but when the sample was heated to 400 °C, α′′ and TiN phases appeared in the microstructure. The samples with 25 at. % Ti also showed no structural changes when heated to 400 °C. When TA=500 °C, α′′ phase formed in the microstructure. The phases formed at 400 or 500 °C in the two samples were stable when the samples were heated up to 800 °C and followed by cooling down to RT.