Effects of doping and Ge fraction grading in the base on the base transit time and Early voltage of Si/SiGe HBTs

Wanrong Zhang,Zeng Zheng,Wengang Wu,Jinsheng Luo
DOI: https://doi.org/10.1109/ICSICT.1995.500192
1995-01-01
Abstract:The base transit time τb and the Early voltage V A for Si/SiGe HBTs with gradients of Ge fraction and doping in the base are studied. It is found that the retarding field, caused by doping grading exhibits 40%-80% contribution to τb depending on the doping level near the emitter, VA increases quasi-exponentially and τb decreases with the increase in gradient of Ge fraction in the base
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