Strain Relaxation of GaN Heterostructure Induced by High-Energy Electron Irradiation

Fu Xuetao,Ma Tongda,Wang Shuming,Zhang Chonghong,Zhang Liqing,Wang Xinqiang
DOI: https://doi.org/10.3969/j.issn.0258-7076.2012.03.022
2012-01-01
Abstract:The unintentional doped GaN epitaxial layers grown by metal organic chemical vapor deposition (MOCVD) were irradiated by 2 MeV electron beam perpendicular to the surfaces with the doses of 1×10 15/cm 2 and 5×10 15/cm 2 at room temperature. The high resolution X-ray diffraction (HRXRD) data presented that the (0004) and (101̄2) diffraction peaks shifted to high-angle and low-angle side respectively. It was indicated that the high energy electron irradiation could induce the strain of GaN epitaxial layers relaxed partially. In addition, the electron back scattering diffraction (EBSD) was employed to characterize the strain relaxation. The visible strain relaxation was recognized in the GaN epitaxial layer by the 5×10 15/cm 2 electron irradiation other than the 1×10 15/cm 2 electron irradiation. Rutherford backscattering spectroscopy in channeling geometry (RBS/C) proved that the 5×10 15/cm 2 electron irradiation resulted in more serious radiation damage in the GaN epitaxial layer. The results from EBSD and RBS/C suggested that strain relaxation of the GaN epitaxial layer was related with the introduction of irradiation defects such as Frenkel pairs by 2 MeV electron irradiation. The strain relaxation mechanism was proposed on the basis of the elastic atom-chain model (EACM).
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