Effects of high-energy electron irradiation on blue luminescence of unintentionally doped GaN heterostructure

Xuekui Fu,Tongda Ma,Chonghong Zhang,Liqing Zhang,Zimin Zhang,Xiaoyin Wang,Hongji Ma,Hailing Tu
DOI: https://doi.org/10.1016/j.nimb.2012.01.054
2012-01-01
Abstract:The unintentionally doped epitaxial GaN was grown on (0001) sapphire by metal organic chemical vapor deposition (MOCVD). The effects of 2MeV electron irradiation with the doses of 1×1015/cm2 and 5×1015/cm2 on the GaN epilayers were investigated by photoluminescence (PL) and Rutherford backscattering spectroscopy (RBS). The blue luminescence (BL) from the GaN epitlayers decreases significantly after the dose of 1×1015/cm2 electron irradiation. This is attributed to complex formation of BL-related defects with other point defects. On the contrary, the BL intensity from the GaN epilayers subjected to electron irradiation with the dose of 5×1015/cm2 increases beyond the BL intensity from the low-dose irradiated one. It is deduced that the surplus gallium vacancies in 1− charge state (VGa1-) could lead to the BL intensity rebounding as electron irradiation damage accumulated.
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