Abstract:Ultra-high purity Corning 7980 and Corning 7979 silica glasses, respectively with high and low contents of hydroxyl and hydrogen, were specifically selected to investigate the effects of O2 loading on the 1.9 eV red luminescence of the gamma-ray induced non-bridging oxygen hole center (NBOHC), whose luminescence intensity is beneficial not only to predict the laser damage of silica but also to the targeted improvements in the preparation-treatment processes of silica. The UV trasmittance spectra, the UV excitation spectra, the visible emission spectra and the red emission lifetime decay curves were determined for these two types of the gammaray irradiated silica glasses before and after O2 loading. The content ratios of Si dangling bond (Si-E ') to NBOHC in silica glasses before and after O2 loading are estimated. The formation precursors and other related defects for NBOHC, such as Si-E ', Si-O-Si bond, Si-O-H bond, peroxy radical and linkage, oxygen-deficient centers ODC(I) and ODC(II), etc, are discussed. The bandwidths of the excitation and emission spectra before and after O2 loading are compared at the lower energy side of the spectra. The average emission lifetimes and especially the decay curves of the red luminescence before and after O2 loading are analyzed. There appear two types of NBOHCs with and without neighbouring hydrogen interaction at room temperature, respectively corresponding to the shorter and longer lifetime components. After O2 loading, the shorter lifetime component disappears and becomes the longer one, indicating that the hydrogen-bonded NBOHC is altered into the non-bonded. It is suggested that the analysis of the shorter and longer lifetime components of the red luminescence can be utilized in the laser damage prediction as well as the preparation and treatment processes of silica.

Generation and Recombination of Defects in Vitreous Silica Induced by Irradiation with a Near-Infrared Femtosecond Laser

Luminescence and Defect Formation by Visible and Near-Infrared Irradiation of Vitreous Silica

Optically induced defects in vitreous silica

Photosensitive defects in germanium doped silica glass

Near-Infrared Femtosecond Laser Induced Defect Formation in High Purity Silica below the Optical Breakdown Threshold

Femtosecond Laser Induced Defects in Various Silica Glasses

Role of hydrogen on the generation and decay of point defects in amorphous silica exposed to UV laser radiation

The Defects in Amorphous Silica under Infrared Femtosecond Laser Irradiation

The transformation balance between two types of structural defects in silica glass in ion-irradiation processes

KrF-excimer Laser Irradiation on the Soda-Lime Silicate Glass

Uv-Laser Irradiation on the Soda-Lime Silicate Glass

Evolutionary Mechanism of the Defects in the Fluoride-Containing Phosphate Based Glasses Induced by Gamma Radiation.

Oxygen-related Vacancy-Type Defects in Ion-Implanted Silicon

Formation and annihilation of point defects in SiO 2 glass during neutron irradiation and annealing

Effects of Oxygen Loading on the Red-Luminescence of Non-Bridging Oxygen Hole Centers in Γ-Irradiated Silica Glasses

Strong UV laser absorption source near 355 nm in fused silica and its origination

Infrared photosensitivity in silica glasses exposed to femtosecond laser pulses

Correlation Between Oxygen Precipitation and Extended Defects in Czochralski Silicon: Investigation by Means of Scanning Infrared Microscopy

Defect-related Infrared Photoluminescence in Ge+-implanted SiO2 Films

Compact HI clouds at high forbidden velocities in the inner Galaxy

X-ray induced nonbridging oxygen hole center in soda-lime silicate glass