Abstract:This experimental PhD work deals with the generation and transformation processes of point defects induced by UV laser irradiation on amorphous silicon dioxide (silica). The investigation relies on several spectroscopic techniques used to probe the microscopic damage induced by UV laser on the material. The most innovative approach, however, is the measurement in situ of the absorption signals related to laser-induced point defects. This technique yields new information on the kinetics of defect processes, inaccessible to previous works based only on stationary measurements of laser-induced damage. The main result is to show that a major damage mechanism of silica under 4.7eV laser radiation is the generation of E' centers (silicon dangling bond defects) by photolysis of pre-existing Si-H bonds. This process occurs by two-photon absorption of laser light, and the produced E' centers are unstable in a wide temperature range: in fact, rupture of Si-H produces hydrogen atoms H together with E'; hence, H atoms dimerize in H_2, which diffuses in the glass and reacts back with the E' centers causing their decay. The generation and decay kinetics of laser-induced E' centers are quantitatively modelled by considering the competition between the laser-induced breakage of Si-H and the concurrent reaction between E' and H_2. The latter reaction is studied in detail at several temperatures: some of its features are found to be affected by the disorder of the glass matrix; moreover, its kinetics is found to be activation-limited rather than diffusion-limited, contrary to what is usually found for the reactions of diffusing species with point defects.

Femtosecond Laser Induced Defects in Various Silica Glasses

The Defects in Amorphous Silica under Infrared Femtosecond Laser Irradiation

Near-Infrared Femtosecond Laser Induced Defect Formation in High Purity Silica below the Optical Breakdown Threshold

Photosensitive defects in germanium doped silica glass

Generation and Recombination of Defects in Vitreous Silica Induced by Irradiation with a Near-Infrared Femtosecond Laser

KrF-excimer Laser Irradiation on the Soda-Lime Silicate Glass

UV–visible Absorption Changes of Lead Silicate Glasses after UV Laser Irradiation

Femtosecond Laser-Induced Microfeatures in Glasses and Their Applications

Microstructures Induced by Femtosecond Laser Pulses Inside Glasses

Uv-Laser Irradiation on the Soda-Lime Silicate Glass

Characterization of artificial indentation defects in fused silica surface and its damage performance under 355 nm nanosecond laser

Infrared photosensitivity in silica glasses exposed to femtosecond laser pulses

Densification of silica glass induced by 0.8 and 1.5μm intense femtosecond laser pulses

Role of hydrogen on the generation and decay of point defects in amorphous silica exposed to UV laser radiation

An Overview of the Thermal Erasure Mechanisms of Femtosecond Laser‐Induced Nanogratings in Silica Glass

Micron-size bubble defects in fused silica and its laser induced damage near 355 nm

Nanoscale investigations of femtosecond laser induced nanogratings in optical glasses

Formation of Si Nanocrystals in Glass by Femtosecond Laser Micromachining

Comparison Of Fused Silica And Oxyfluoride Glass On Laser Induced Initial Damage Morphology

Femtosecond laser-induced microstructures in glasses and applications in micro-optics.

Material migration and damage characteristics of fused silica optical surface treated by CO 2 laser/short – pulse ultraviolet laser