Abstract:Oxygen ions (O + ) were implanted into fused silica at a fixed fluence of 1 × 10 17 ions/cm 2 with different ion energies ranging from 10 keV to 60 keV. The surface roughness, optical properties, mechanical properties and laser damage performance of fused silica were investigated to understand the effect of oxygen ion implantation on laser damage resistance of fused silica. The ion implantation accompanied with sputtering effect can passivate the sub-/surface defects to reduce the surface roughness and improve the surface quality slightly. The implanted oxygen ions can combine with the structural defects (ODCs and E′ centers) to reduce the defect densities and compensate the loss of oxygen in fused silica surface under laser irradiation. Furthermore, oxygen ion implantation can reduce the Si–O–Si bond angle and densify the surface structure, thus introducing compressive stress in the surface to strengthen the surface of fused silica. Therefore, the laser induced damage threshold of fused silica increases and the damage growth coefficient decreases when ion energy up to 30 keV. However, at higher ion energy, the sputtering effect is weakened and implantation becomes dominant, which leads to the surface roughness increase slightly. In addition, excessive energy aggravates the breaking of Si–O bonds. At the same time, the density of structural defects increases and the compressive stress decreases. These will degrade the laser laser-damage resistance of fused silica. The results indicate that oxygen ion implantation with appropriate ion energy is helpful to improve the damage resistance capability of fused silica components.

Comparison Of Fused Silica And Oxyfluoride Glass On Laser Induced Initial Damage Morphology

The Damage Property of Oxyfluoride Glasses Irradiated by a 351 Nm High Fluence Laser

Preparation Of The Oxyfluoride Glass With High 3 Omega Laser Induced Damage Threshold

Femtosecond laser-induced damage characteristics of mid-infrared oxyfluorogallate glass

Laser Induced Damage in Fused Silica for 248 nm

On Laser-Induced Damage Features in an Ultraviolet (uv) Fluorophosphate Glass when Irradiated with A Nanosecond Laser Beam

Laser Induced Damage Characteristics of Fused Silica Optics Treated by Wet Chemical Processes

Laser-damage Growth Characteristics of Fused Silica under 1064- and 532-Nm Laser Irradiation

Surface Defects, Stress Evolution, and Laser Damage Enhancement Mechanism of Fused Silica under Oxygen-Enriched Condition

Laser-Induced Damage Growth on Larger-Aperture Fused Silica Optical Components at 351 Nm

Improving Uv Laser Damage Threshold Of Fused Silica Optics By Wet Chemical Etching Technique

Fundamental-frequency-absorbed Oxyfluoride Glass in a High-Power Laser

Damage Growth Characteristics of Different Initial Damage Sites of Fused Silica under 355 Nm Small Laser Beam Irradiation

Ab Initio Molecular Dynamics Simulation of the Effect of Impurities on Laser-Induced Damage of Fused Silica

Damage Behaviors of Silica Microparticles on Fused Silica Optics under 355 Nm High Fluence Laser

Laser-induced damage growth of large-aperture fused silica optics under high-fluence 351 nm laser irradiation

Damage Morphologies of Al2O3 and Fe Particles Attached on the Input Surface of Fused Silica after Irradiation by a 355 Nm Laser.

Study on the laser-induced damage characteristics and structure changes of fluorotellurite glass under femtosecond pulsed laser irradiation

The damage mechanisms of fused silica irradiated by 355nm laser in vacuum

Laser-induced fluorescence and its effect on the damage resistance of fluoride-containing phosphate-based glasses

Characterization of 355 Nm Laser-Induced Damage of Mitigated Damage Sites in Fused Silica