Behavior of 355 nm laser-induced damage growth in fused silica

Hufeng Liu,Biyi Wang,Xinxiang Miao,Man Xu,Xinyi Liu,Fawang Zhang,Tao Lü,Rong Qiu,Decheng Guo,Qiang Zhou,Yong Jiang
DOI: https://doi.org/10.1016/j.optlastec.2022.108847
2022-11-06
Abstract:The behavior of morphology and crack propagation during damage growth on the rear surface of fused silica is studied using a time-resolved shadow imaging technique. The mechanism and distribution characteristics of the plasma caused by energy deposition during the damage growth process and the effect on crack extension are studied. Finally, the properties of shock and stress waves and their effects on the damage growth are discussed. The results indicate that the damage growth process leads to significant differences in the transmission of shock and stress waves. The growth size of the damage site leads to a significant energy concentration deposition effect, which induces a local enhancement of the plasma that subsequently affects the crack distribution. It contributes to the transition from radial to circumferential crack and also further accelerates the damage growth process. The results could contribute to experimental support for further understanding of the physical mechanism of fused silica damage and the fundamental principles of damage growth.
optics,physics, applied
What problem does this paper attempt to address?