The Defects in Amorphous Silica under Infrared Femtosecond Laser Irradiation

周秦岭,刘丽英,徐雷,干福熹

2003-01-01

Laser & Optoelectronics Progress

Abstract:The characteristics of the defects in fused silica are reviewed, and possible mechanism of infrared femtosecond laser inducing defects in silica glass is analyzed.

What problem does this paper attempt to address?

Femtosecond Laser Induced Defects in Various Silica Glasses

周秦岭,刘丽英,徐雷,王文澄,邱建荣,朱从善,干福熹

IF: 2.56

2004-01-01

Chinese Optics Letters

Abstract:The mechanism of near infrared (IR) focused femtosecond (fs) laser induced defects in silica glasses produced by different methods is systematically investigated through measurements of absorption, fluorescence, and electronic spin resonance (ESR) spectra. The influence of impurities and hydroxyl groups on defects is discussed. The results show that ES silica glasses containing high OH and few defects are much stable under fs laser irradiation. It is also verified that Si E?' center formation has no direct relation with chloride ions.
Photosensitive defects in germanium doped silica glass

Xiaofeng Jin,Zhongxian Zhang,SenLu Xu,Guoguang Yang

1998-01-01

Abstract:The features of photosensitive defects in germanium doped silica glass under the irradiation of 488 nm argon laser and 193 nm ArF excimer laser are studied. The measurement of UV-induced absorption bands and photoluminescence changes and the experiment on electron spin resonance are carried out. The structural models of two defects are presented. The bleaching dynamics of absorption with laser irradiation is analyzed. The photosensitive processes with different laser sources are discussed.
Near-Infrared Femtosecond Laser Induced Defect Formation in High Purity Silica below the Optical Breakdown Threshold

QL Zhou,LY Liu,L Xu,WC Wang,CS Zhu,FX Gan

DOI: https://doi.org/10.1088/0256-307x/20/10/331

2003-01-01

Abstract:Optical absorption, electron spin resonance and photoluminescence spectra were used to study the defect formation in high purity fused silica induced by a focused infrared femtosecond laser with the input intensity below damage threshold. Si E' centres were formed in the silica. The number of Si E' centre was found increasing linearly with power density of the fs laser, deviated from the increment photo-induced free carrier density. We concluded that the colour centres were formed at the defect sites that were newly generated by radiolysis of silica tetrahedral network and displacement of oxygen between two silicon atoms. Material structure is already modified even though the irradiation fs laser power was well below the damage threshold.
Generation and Recombination of Defects in Vitreous Silica Induced by Irradiation with a Near-Infrared Femtosecond Laser

Hong-Bo Sun,Saulius Juodkazis,Mitsuru Watanabe,Shigeki Matsuo,Hiroaki Misawa,Junji Nishii

DOI: https://doi.org/10.1021/jp992828h

IF: 3.466

2000-01-01

The Journal of Physical Chemistry B

Abstract:Properties of defects induced by irradiation with a near-infrared femtosecond laser beam into vitreous silica are reported. Three photoluminescence bands with photon energy of 1.9, 2.7, and 4.4 eV were observed under an excitation of 5.0 eV. An isochronal annealing experiment revealed that unrelaxed oxygen vacancies ODC(II) and interstitial oxygen were generated as dominant species during the irradiation. In the annealing, diffusion of the interstitial oxygen was thermally activated, leading to a direct reduction of oxygen-deficiency-related defects such as ODC(II) and E‘ center. The concentration of oxygen-excess-related defects such as peroxy radicals, together with nonbridging oxygen−hole centers, increased first with annealing then decreased with the exhaustion of oxygen and their precursor, the E‘ center. The recombination of oxygen vacancies with interstitial oxygen is characterized as the major process occurring during the annealing.
Characterization of artificial indentation defects in fused silica surface and its damage performance under 355 nm nanosecond laser

Zhichao Liu,Jian Zhang,Jin Luo,Feng Geng,Jian Cheng,Shengfei Wang,Qinghua Zhang,Jian Wang,Qiao Xu

DOI: https://doi.org/10.1016/j.optlastec.2023.109468

2023-05-06

Abstract:The mechanical defect of fused silica caused by polishing process is the main reason for the decrease of laser-induced damage threshold (LIDT). In this paper, the artificial indentation was used to alternatively study the feature of machining defects and its laser damage properties. The Vickers indentation on fused silica surface were characterized with SEM, photoluminescence (PL) spectroscopy and photothermal absorption. Combined with hydrofluoric (HF) acid etching, the relationship between indentation intrinsic feature and LIDT was revealed. Crack and brittle fracture in the indentation contain various point defects, cause PL intensity and photothermal absorption increasing. By use of time resolved pump–probe imaging technology, we confirmed that energy absorption process during laser damage mostly initiates at the crack region. Shallow etching with HF acid (about 150 nm depth etched) removes a certain material and effectively reduces the density of point defects in the superficial layer of the indentation, consequential reduces the photothermal absorption and PL intensity, and finally improves LIDT.

optics,physics, applied
Irradiation Defects in Silicon Crystal

WUCheng-long,YANGDe-ren

2003-01-01

Abstract:The application of irradiation in silicon crystal is introduced.The defects caused by irradiation are reviewed and some major ways of studying defects in irradiated silicon are summarized.Furthermore the problems in the investigation of irradiated silicon are discussed as well as its properties.
Evolution of point defects in mechanical cracks of fused silica after CO_2 laser melting

Zhichao Liu,Ting Tan,Geng Feng,Shengfei Wang,Jian Zhang,Hongjun Liu,Qinghua Zhang,Fei Fan,Jian Wang,Qiao Xu,Feng Geng

DOI: https://doi.org/10.1364/ome.500395

2024-01-25

Optical Materials Express

Abstract:Zhichao Liu, Ting Tan, Feng Geng, Shengfei Wang, Jian Zhang, Hongjun Liu, Qinghua Zhang, Fei Fan, Jian Wang, Qiao Xu The traditional polishing method inevitably results in subsurface cracks in the fused silica, which seriously degrades their ultraviolet ... [Opt. Mater. Express 14, 414-423 (2024)]

materials science, multidisciplinary,optics
Role of hydrogen on the generation and decay of point defects in amorphous silica exposed to UV laser radiation

F. Messina

DOI: https://doi.org/10.48550/arXiv.cond-mat/0703130

2007-03-05

Materials Science

Abstract:This experimental PhD work deals with the generation and transformation processes of point defects induced by UV laser irradiation on amorphous silicon dioxide (silica). The investigation relies on several spectroscopic techniques used to probe the microscopic damage induced by UV laser on the material. The most innovative approach, however, is the measurement in situ of the absorption signals related to laser-induced point defects. This technique yields new information on the kinetics of defect processes, inaccessible to previous works based only on stationary measurements of laser-induced damage. The main result is to show that a major damage mechanism of silica under 4.7eV laser radiation is the generation of E' centers (silicon dangling bond defects) by photolysis of pre-existing Si-H bonds. This process occurs by two-photon absorption of laser light, and the produced E' centers are unstable in a wide temperature range: in fact, rupture of Si-H produces hydrogen atoms H together with E'; hence, H atoms dimerize in H_2, which diffuses in the glass and reacts back with the E' centers causing their decay. The generation and decay kinetics of laser-induced E' centers are quantitatively modelled by considering the competition between the laser-induced breakage of Si-H and the concurrent reaction between E' and H_2. The latter reaction is studied in detail at several temperatures: some of its features are found to be affected by the disorder of the glass matrix; moreover, its kinetics is found to be activation-limited rather than diffusion-limited, contrary to what is usually found for the reactions of diffusing species with point defects.
KrF-excimer Laser Irradiation on the Soda-Lime Silicate Glass

Jian Zhang,Wen Dong,Yuliang Zhang,Jiawei Sheng

DOI: https://doi.org/10.1016/j.ijhydene.2009.02.009

IF: 7.2

2009-01-01

International Journal of Hydrogen Energy

Abstract:Defects induced by KrF-excimer laser irradiation in the soda-lime silicate glass were studied by means of optical spectrophotometric and electron spin resonance measurements. Three induced absorption bands at peak position of 610, 420, and 275nm were determined in the glass after the UV-laser radiation, with the assistance of Gaussian resolution method. The defects of nonbridging oxygen hole centers attributed to two absorption peaks at 610 and 420nm, and the trapped electrons correlated to the absorption at 275nm. The induced absorption bands increased when laser irradiation time or energy density increased.
The transformation balance between two types of structural defects in silica glass in ion-irradiation processes

Tengfei Yang,Yuan Gao,Xuejun Huang,Yanwen Zhang,Marcel Toulemonde,Jianming Xue,Sha Yan,Yugang Wang

DOI: https://doi.org/10.1016/j.jnoncrysol.2011.05.017

IF: 4.458

2011-01-01

Journal of Non-Crystalline Solids

Abstract:Structural modification in silica glass irradiated by Au ions was investigated by ultraviolet (UV), photoluminescence and Raman spectrum at the energies from 0.5 to 8MeV with a fluence of 5×1013cm−2. In this transit energy region, both nuclear energy loss and electronic energy loss are not negligible. It was found that both the formation of irradiation-induced intrinsic defects and structural transformation from irregular large ring structure (LRS) to small three- and four-member ring structures (SRS) are dominated by the nuclear energy loss. Furthermore, unlike the case of irradiation with β, γ or proton, the concentration of non-bridging oxygen hole center is much enhanced followed with a distinct peak appearing at 5.05eV in the UV absorption spectra that is attributed to divalent Si. The results suggest that the structural modification in silica glass in the transit energy region is dominated by nuclear energy loss. A mutual transformation balance model among irradiation-induced intrinsic defects, LRS and SRS is established to interpret the identical variation tendencies of intrinsic defects and structural transformation with ion energy.
Uv-Laser Irradiation on the Soda-Lime Silicate Glass

Jiawei Sheng,Yanfen Wu,Xinji Yang,Jian Zhang

DOI: https://doi.org/10.1016/j.ijhydene.2008.10.097

IF: 7.2

2009-01-01

International Journal of Hydrogen Energy

Abstract:Defects induced by ArF UV-laser irradiation in the soda-lime silicate glass were studied by means of optical spectrophotometric and electron spin resonance measurements. The UV-laser induced defects in glass showed similar behavior to the X-ray induced defects. The defects of nonbridging oxygen hole centers attributed to two absorption peaks at 431 and 627nm which were observed in the glass after the UV-laser radiation. The induced absorption increased when laser irradiation time or energy density increased. Our results demonstrated that the induced color in glass by UV-laser radiation could be bleached reversibly, which provides an alternative way to develop a recyclable colored glass.
Micron-size bubble defects in fused silica and its laser induced damage near 355 nm

Shuo Hu,Hongyu Li,Bo Dong,Chuan Ma,Shuai Zhang,Haozhe Liu,Lihua Lu,Jiaxuan Chen,Xinxiang Miao

DOI: https://doi.org/10.1016/j.ceramint.2022.11.302

IF: 5.532

2023-04-15

Ceramics International

Abstract:In this paper, considering micro-bubble as a factor affecting the quality of optical components assembled in high-energy laser system, the behavior of small bubble inside high-temperature fused silica is investigated by two-phase flow theory. Furthermore, the effect of microbubbles as high-energy laser damage precursor is studied in detail. It is found that if micro-cracks or voids exist in fused silica during synthesis, basically spherical bubbles could be formed and hardly released. Thereafter, light intensity enhancement effect is evaluated at the initial stage of laser-induced damage. Both single and double bubbles attribute to laser energy intensification in a specific area. The Gaussian pulsed laser near 355 nm is utilized to test laser-induced damage thresholds (LIDTs), and the LIDTs of fused silica with unreleased micro-bubbles decrease from 9.7J/cm2 to ∼7.0 J/cm2. The surface damage morphologies and laser-induced material modifications due to micro-bubble are much more disastrous than those without defects. We propose that the Gaussian laser-induced damage morphologies are partitioned into three feature zones for fused silica with unreleased bubbles. The research in this paper provides underlying guidance for ameliorating the quality of fused silica and understanding laser-induced damage.

materials science, ceramics
An Overview of the Thermal Erasure Mechanisms of Femtosecond Laser‐Induced Nanogratings in Silica Glass

Yitao Wang,Maxime Cavillon,Nadège Ollier,Bertrand Poumellec,Matthieu Lancry

DOI: https://doi.org/10.1002/pssa.202100023

2021-04-29

physica status solidi (a)

Abstract:<section class="article-section__content"><p>Type II modifications induced by infrared (IR) femtosecond (fs) lasers are used in many optical devices due to their excellent thermal stability at high temperatures (typically >800 °C). The characteristic feature of type II modifications is the formation of nanogratings, which are easily detected through birefringence measurements. However, the measured birefringence is an aggregate value of multiple contributions including form birefringence, stress‐induced birefringence due to permanent volume changes, and point defects. This work investigates the thermal erasure kinetics of each one of these contributions in silica glass. Firstly, samples are irradiated with a fs‐laser using different conditions (polarization, energy). Secondly, accelerated aging experiments are conducted to evaluate the stability of the laser‐induced modifications, including defects, densification, stress field, and porous nanogratings. Finally, the aforementioned contributions to the thermal stability of the nanogratings are identified using spectroscopic techniques (Raman, Rayleigh scattering, UV–vis absorption) and electron microscopy. Moreover, porous nanogratings erasure kinetics are simulated using the Rayleigh–Plesset equation. Herein, a valuable framework in the realization of silica glass‐based optical devices operating at high temperatures (≫800 °) is provided by 1) evidencing the effect of annealing on each erasure mechanism and 2) providing information on the optical response (mainly birefringence) upon annealing.</p></section>
Characterization of Morphology and Mechanical Properties of Glass Interior Irradiated by Femtosecond Laser

Panjawat Kongsuwan,Hongliang Wang,Sinisa Vukelic,Y. Lawrence Yao

DOI: https://doi.org/10.1115/1.4002062

2010-07-23

Journal of Manufacturing Science and Engineering

Abstract:Femtosecond laser pulses were focused in the interior of a single fused silica piece. Proper use of optical and laser processing parameters generated structural rearrangement of the material through a thermal accumulation mechanism, which could be potentially used for the transmission welding process. The morphology of generated features was studied using differential interference contrast optical microscopy. In addition, the predictive capability of the morphology is developed via a finite element analysis. The change in mechanical properties was studied through employment of spatially resolved nanoindentation. The specimen was sectioned and nanoindents were applied at the cross section to examine mechanical responses of the laser-modified region. Fracture toughness measurements are carried out to investigate the effects of the laser treatment on strength of the glass.

engineering, mechanical, manufacturing
Effect of Different Etching Processes on Surface Defects of Quartz Crystals

Qingzhi Li,Yubin Zhang,Zhaohua Shi,Weihua Li,Xin Ye

DOI: https://doi.org/10.3390/coatings13101785

IF: 3.236

2023-10-18

Coatings

Abstract:In high-power laser systems, the loading capacity of fused silica components under 351 nm irradiation is an important factor limiting their ability to increase output power, and in the current study, the damage threshold enhancement of fused silica components after RIE and AMP treatments has been investigated. Sub-surface defects in fused silica components after RIE treatment have also been investigated, but the reason for the high damage threshold could never be explained. Since quartz crystals and fused silica belong to the same silica system, and quartz crystals have more characterisation means than fused silica, we can extrapolate to fused silica by studying quartz crystals. We can extrapolate to fused silica by studying quartz crystals, which are characterised by more means than fused silica, and prove that the extrapolation is correct by characterising fused silica. In this study, the relationship between the etching process and the damage threshold is concluded by studying different RIE etching processes, and the damage threshold of the samples is optimal when the etching depth is 1 um.

materials science, multidisciplinary,physics, applied, coatings & films
Laser-induced Periodic Annular Surface Structures on Fused Silica Surface

Yi Liu,Yohann Brelet,Zhanbing He,Linwei Yu,Benjamin Forestier,Yongkai Deng,Hongbing Jiang,Aurelien Houard

DOI: https://doi.org/10.1063/1.4812354

IF: 4

2013-01-01

Applied Physics Letters

Abstract:We report on the formation of laser-induced periodic annular surface structures on fused silica irradiated with multiple femtosecond laser pulses. This surface morphology emerges after the disappearance of the conventional laser induced periodic surface structures, under successive laser pulse irradiation. It is independent of the laser polarization and universally observed for different focusing geometries. We interpret its formation in terms of the interference between the reflected laser field on the surface of the damage crater and the incident laser pulse. (C) 2013 AIP Publishing LLC.
Densification of silica glass induced by 0.8 and 1.5μm intense femtosecond laser pulses

A. Saliminia,N T. Nguyen,S L. Chin,R Vallée

DOI: https://doi.org/10.1063/1.2196237

IF: 2.877

2006-05-01

Journal of Applied Physics

Abstract:We investigate the physical mechanisms responsible for waveguide formation in silica glass induced by 1kHz intense femtosecond laser pulses from a Ti-sapphire laser at 0.8μm as well as from a femtosecond optical parametric amplifier at 1.5μm. It is demonstrated that the densification taking place at the irradiated region is the principal cause for refractive index change in the waveguides written with both 0.8 and 1.5μm pulses. The birefringence induced by the stress arising from such densification and its behavior against thermal annealing are also studied.

physics, applied
Infrared photosensitivity in silica glasses exposed to femtosecond laser pulses

D. Homoelle,S. Wielandy,Alexander L. Gaeta,N. F. Borrelli,Charlene Smith

DOI: https://doi.org/10.1364/ol.24.001311

IF: 3.6

1999-09-15

Optics Letters

Abstract:We investigate the use of infrared femtosecond laser pulses to induce highly localized refractive-index changes in fused-silica glasses. We characterize the magnitude of the change as a function of exposure and measure index changes as large as 3x10(-3) and 5x10(-3) in pure fused silica and boron-doped silica, respectively. The potential of this technique for writing three-dimensional photonic structures in bulk glasses is demonstrated by the fabrication of a Y coupler within a sample of pure fused silica.

optics
Behavior of 355 nm laser-induced damage growth in fused silica

Hufeng Liu,Biyi Wang,Xinxiang Miao,Man Xu,Xinyi Liu,Fawang Zhang,Tao Lü,Rong Qiu,Decheng Guo,Qiang Zhou,Yong Jiang

DOI: https://doi.org/10.1016/j.optlastec.2022.108847

2022-11-06

Abstract:The behavior of morphology and crack propagation during damage growth on the rear surface of fused silica is studied using a time-resolved shadow imaging technique. The mechanism and distribution characteristics of the plasma caused by energy deposition during the damage growth process and the effect on crack extension are studied. Finally, the properties of shock and stress waves and their effects on the damage growth are discussed. The results indicate that the damage growth process leads to significant differences in the transmission of shock and stress waves. The growth size of the damage site leads to a significant energy concentration deposition effect, which induces a local enhancement of the plasma that subsequently affects the crack distribution. It contributes to the transition from radial to circumferential crack and also further accelerates the damage growth process. The results could contribute to experimental support for further understanding of the physical mechanism of fused silica damage and the fundamental principles of damage growth.

optics,physics, applied
UV–visible Absorption Changes of Lead Silicate Glasses after UV Laser Irradiation

HZ Jia,GH Chen,ZJ Hou,LY Liu,WC Wang,M Affatigato,S Feller

DOI: https://doi.org/10.1016/s0022-3093(03)00011-5

IF: 4.458

2003-01-01

Journal of Non-Crystalline Solids

Abstract:UV–visible absorption spectra of binary lead silicate glasses with different lead concentrations were measured after irradiation with the frequency-quadrupled output of a Q-switched YAG laser (266 nm, 10 Hz repetition rate). Two different changes of absorption spectra after exposure to laser beams with different energy densities were observed. This implied that the formation of defects in lead silicate glasses was connected to the UV beam energy density.

The Defects in Amorphous Silica under Infrared Femtosecond Laser Irradiation

Femtosecond Laser Induced Defects in Various Silica Glasses

Photosensitive defects in germanium doped silica glass

Near-Infrared Femtosecond Laser Induced Defect Formation in High Purity Silica below the Optical Breakdown Threshold

Generation and Recombination of Defects in Vitreous Silica Induced by Irradiation with a Near-Infrared Femtosecond Laser

Characterization of artificial indentation defects in fused silica surface and its damage performance under 355 nm nanosecond laser

Irradiation Defects in Silicon Crystal

Evolution of point defects in mechanical cracks of fused silica after CO_2 laser melting

Role of hydrogen on the generation and decay of point defects in amorphous silica exposed to UV laser radiation

KrF-excimer Laser Irradiation on the Soda-Lime Silicate Glass

The transformation balance between two types of structural defects in silica glass in ion-irradiation processes

Uv-Laser Irradiation on the Soda-Lime Silicate Glass

Micron-size bubble defects in fused silica and its laser induced damage near 355 nm

An Overview of the Thermal Erasure Mechanisms of Femtosecond Laser‐Induced Nanogratings in Silica Glass

Characterization of Morphology and Mechanical Properties of Glass Interior Irradiated by Femtosecond Laser

Effect of Different Etching Processes on Surface Defects of Quartz Crystals

Laser-induced Periodic Annular Surface Structures on Fused Silica Surface

Densification of silica glass induced by 0.8 and 1.5μm intense femtosecond laser pulses

Infrared photosensitivity in silica glasses exposed to femtosecond laser pulses

Behavior of 355 nm laser-induced damage growth in fused silica

UV–visible Absorption Changes of Lead Silicate Glasses after UV Laser Irradiation