Influence Of Patterned Tio2/Sio2 Dielectric Multilayers For Back And Front Mirror Facets On Gan-Based Laser Diodes

Weihua Chen,Xiaodong Hu,Tao Dai,Rui Li,Xuemin Ye,TaiPing Zhao,Weimin Du,Zhijian Yang,Guoyi Zhang
DOI: https://doi.org/10.1088/1674-1056/17/9/036
2008-01-01
Chinese Physics B
Abstract:Ridge InGaN multi-quantum-well-structure (MQW) edge-emitting laser diodes (LDs) were grown on (0001) sapphire substrates by low-pressure metal-organic chemical vapour deposition (MOCVD). The dielectric TiO2/SiO2 front and back facet coatings as cavity mirror facets of the LD shave been deposited with electron-beam evaporation method. There ectivity of the designed front coating is about 50% and that of the back high reflective coating is as high as 99.9%. Under pulsed current injection at room temperature, the influences of the dielectric facets were discussed. The threshold current of the ridge GaN-based LDs was decreased after the deposition of the backhigh reective dielectric mirror and decreased again after the front facets were deposited. Above the threshold, the slope efficiency of the LDs with both reflective facets was larger than those with only back facets and without any reflective facets. It is important to design there ectivity of the front facets for improving the performance of GaN-based LDs.
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