Abstract:Zinc oxide is a multifunctional material with a direct band gap of 3.37 eV and a high exciton binding energy of 60 meV. It also havs piezo- and pyro-electric properties [ 1 ]. It is therefore promising for applications in optics, optoelectronics, electromechanics and photonics. The routinely used physical vapor deposition (PVD) methods [ 2 ] for ZnO-based thin film growth usually lead to polycrystalline nature and non-uniform composition distribution in the thin film. Post-annealing process can improve the crystallinity and hence the electrical properties, but it may not suitable for applications on flexible substrates. By contrast, the chemical bath deposition [ 3 ] (CBD) is a low-cost and straightforward process for large-area fabrication of ZnO thin film growth. In order to increase the texture, and hence the quality, of the ZnO thin film, we modify the surface energy of the substrate by depositing two kinds of self-assembled monolayers with different hydrophilic properties: one is the methyl end group and the other is amino end group. We find that highly (0001) textured ZnO thin films can be grown on the substrate that is ended with the methyl group. Using such surface modification approach, a straightforward method to deposit ZnO thin films can be realized on arbitrary flexible substrates. In this work, we use the convergent beam electron diffraction (CBED) and electron energy loss spectroscopy (EELS) techniques to study the micro-structure and chemical properties of the ZnO layer. The relations between the microstructure and the optical property will be discussed.

Fabrication and Characteristics of ZnO Thin Films Deposited by RF Sputtering on Plastic Substrates for Flexible Display

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

The growth of nanoscale ZnO films by pulsed-spray evaporation chemical vapor deposition and their structural, electric and optical properties

Microstructure and Optical Properties of ZnO Films Deposited by Radio-frequency Reactive Magnetron Sputtering

Influence of Sputtering Power on Properties of ZnO Thin Films Fabricated by RF Sputtering in Room Temperature

Fabrication And Characteristics Of Zno-Based Thin Film Transistors

Reactive Radiofrequency Sputtering-Deposited Nanocrystalline ZnO Thin-Film Transistors

Structures and Electric Properties of RF Sputtered ZnO Films

B23-O-15 Van Der Waals Epitaxial Growth of Highly-textured ZnO Thin Film on Surface-modified Silicon Substrates by Chemical Bath Deposition

Crystalline Structure Effect on the Performance of Flexible ZnO/polyimide Surface Acoustic Wave Devices

Deposition and Characterization of Sputtered ZnO Films

Fabrication and Characteristics of the Low-Resistive P-Type ZnO Thin Films by DC Reactive Magnetron Sputtering

Transparent ZnO thin-film transistor fabricated by rf magnetron sputtering

Fully transparent flexible tin-doped zinc oxide thin film transistors fabricated on plastic substrate

Fabrication and Characteristics of ZnO Thin Films with an Al/Si (100) Substrates

Flexible Nickel-Doped Zinc Oxide Thin-Film Transistors Fabricated On Plastic Substrates At Low Temperature

Systematic control of carrier concentration and resisitivity in RF sputtered Zinc oxide thin films

Radio frequency magnetron sputtering deposition of low-resistivity and broad-spectral transmission F and Al co-doped ZnO film with mobility exceeding 50 cm2 V−1 s−1

Transparent and Conductive Ga-doped ZnO Films Grown by RF Magnetron Sputtering on Polycarbonate Substrates

Crystal Growth of Undoped ZnO Films on Si Substrates under Different Sputtering Conditions

ZnO film for application in surface acoustic wave device