B23-O-15 Van Der Waals Epitaxial Growth of Highly-textured ZnO Thin Film on Surface-modified Silicon Substrates by Chemical Bath Deposition

Chia-Hao Yu,Kuan-Hung Chen,Zhang-Chen Luo,Shao-Sian Li,Yih-Ren Chang,Chien-Ting Wu,Chun-Wei Chen,Cheng-Yen Wen

DOI: https://doi.org/10.1093/jmicro/dfv174

2015-01-01

Microscopy

Abstract:Zinc oxide is a multifunctional material with a direct band gap of 3.37 eV and a high exciton binding energy of 60 meV. It also havs piezo- and pyro-electric properties [ 1 ]. It is therefore promising for applications in optics, optoelectronics, electromechanics and photonics. The routinely used physical vapor deposition (PVD) methods [ 2 ] for ZnO-based thin film growth usually lead to polycrystalline nature and non-uniform composition distribution in the thin film. Post-annealing process can improve the crystallinity and hence the electrical properties, but it may not suitable for applications on flexible substrates. By contrast, the chemical bath deposition [ 3 ] (CBD) is a low-cost and straightforward process for large-area fabrication of ZnO thin film growth. In order to increase the texture, and hence the quality, of the ZnO thin film, we modify the surface energy of the substrate by depositing two kinds of self-assembled monolayers with different hydrophilic properties: one is the methyl end group and the other is amino end group. We find that highly (0001) textured ZnO thin films can be grown on the substrate that is ended with the methyl group. Using such surface modification approach, a straightforward method to deposit ZnO thin films can be realized on arbitrary flexible substrates. In this work, we use the convergent beam electron diffraction (CBED) and electron energy loss spectroscopy (EELS) techniques to study the micro-structure and chemical properties of the ZnO layer. The relations between the microstructure and the optical property will be discussed.