Abstract:Zinc oxide is a multifunctional material with a direct band gap of 3.37 eV and a high exciton binding energy of 60 meV. It also havs piezo- and pyro-electric properties [ 1 ]. It is therefore promising for applications in optics, optoelectronics, electromechanics and photonics. The routinely used physical vapor deposition (PVD) methods [ 2 ] for ZnO-based thin film growth usually lead to polycrystalline nature and non-uniform composition distribution in the thin film. Post-annealing process can improve the crystallinity and hence the electrical properties, but it may not suitable for applications on flexible substrates. By contrast, the chemical bath deposition [ 3 ] (CBD) is a low-cost and straightforward process for large-area fabrication of ZnO thin film growth. In order to increase the texture, and hence the quality, of the ZnO thin film, we modify the surface energy of the substrate by depositing two kinds of self-assembled monolayers with different hydrophilic properties: one is the methyl end group and the other is amino end group. We find that highly (0001) textured ZnO thin films can be grown on the substrate that is ended with the methyl group. Using such surface modification approach, a straightforward method to deposit ZnO thin films can be realized on arbitrary flexible substrates. In this work, we use the convergent beam electron diffraction (CBED) and electron energy loss spectroscopy (EELS) techniques to study the micro-structure and chemical properties of the ZnO layer. The relations between the microstructure and the optical property will be discussed.

Preparation of highly textured ZnO thin films by pulsed electron deposition

The growth of nanoscale ZnO films by pulsed-spray evaporation chemical vapor deposition and their structural, electric and optical properties

Effect of Nucleation and Growth Kinetics on the Electrical and Optical Properties of Undoped ZnO Films

Zno-based Thin Films Synthesized by Atmospheric Pressure Mist Chemical Vapor Deposition

Advances in Research on Deposition Techniques for ZnO Thin Films

Structural and Optical Characterizations of ZnO Films Grown by Reactive Electron Beam Evaporation

B23-O-15 Van Der Waals Epitaxial Growth of Highly-textured ZnO Thin Film on Surface-modified Silicon Substrates by Chemical Bath Deposition

STRUCTURAL AND OPTICAL STUDIES OF ZnO FILMS GROWN AT LOW TEMPERATURE

Preferential growth of ZnO thin films by the atomic layer deposition technique

Pulsed Laser Reactive Ablation of (0001)-Textured ZnO Optical Waveguiding Films on Α-Sio2

Fabrication of Highly (1000) Oriented Textured Zinc Oxide Films by Metal Cathodic Arc and Oxygen Dual Plasma Deposition and Their Optical Properties

Room Temperature Growth and Properties of ZnO Films by Pulsed Laser Deposition

Low-temperature Deposition of Transparent ZnO Films by the Ultrasonic-Mediated Stepwise Method

Properties of ZnO thin films grown on Si substrates in vacuum and oxygen ambient by pulsed laser deposition

Preparation of ZnO Thin Films by Pulsed Laser Deposition

Research of Deposition Condition and Structural Properties of ZnO Films Grown by RF Magnetron Sputtering

Crystallization Properties of ZnO Thin Films Synthesized by Plasma Enhanced Chemical Vapor Deposition

The Effects of Substrate Temperature on the Structure and Properties of ZnO Films Prepared by Pulsed Laser Deposition

Electrochemical Deposition and Characterization of Wide Band Semiconductor ZnO Thin Film

Structural, optical and electrical properties of ZnO thin films prepared by reactive deposition

Study of ZnO Thin Films Prepared by Ultrasonic Spray Pyrolysis