Ordered ultra thin ZnO films on metal substrate

Donghui Guo,Mingshan Xue,Qinlin Guo,Kehui Wu,Jiandong Guo,E. G. Wang
DOI: https://doi.org/10.1016/j.apsusc.2009.06.081
IF: 6.7
2009-01-01
Applied Surface Science
Abstract:Ultra thin ZnO films were prepared on metal Mo(110) substrate under ultrahigh vacuum conditions either by depositing Zn in ∼10−5Pa oxygen or by oxidizing pre-deposited Zn films. The films were characterized in situ by various surface analytical techniques, including Auger electron spectroscopy, X-ray and ultraviolet photoelectron spectroscopies, low energy electron diffraction and high resolution electron energy loss spectroscopy. The results indicate that a long-range ordered and stoichiometric ZnO films are formed along its [0001] direction. The annealing experiments show that as-prepared ZnO films are thermal stable until 800K. This study provides constructive information to further understand the growth mechanism of ZnO films on different substrates.
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