Advances in Research on Deposition Techniques for ZnO Thin Films

汪雷
DOI: https://doi.org/10.3321/j.issn:1005-023x.2002.09.012
2002-01-01
Abstract:Zinc oxide is a novel material for Ⅱ-Ⅵ semiconductor.A number of deposition techniques for ZnO thin films are now available,such as magnetron sputtering,spray pyrolysis,molecular beam epitaxy,pulsed laser deposition,metal-organic chemical vapor deposition and some novel growth technologies,including sol-gel,atomic layer epitaxy,chemical bath deposition,ion beam assisted deposition,successive ion layer adsorption and reactions,film oxidation,and so on.In this work,advances in research on deposition techniques for ZnO thin films are reviewed in detail.
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