Abstract:GZO thin films were succesfully deposited onto n-Si and glass substrates by RF magnetron sputtering at room temperature. The structural, morphological and opto-electrical properties of the films were investigated in terms of RF power, using various methods such as XRD, AFM, SEM, EDX, XPS, SIMS, UV–Vis–NIR spectroscopy and Hall effect measurements. The achieved results revealed that the all films have highly c-axis (002) oriented polycrystalline structure with high transmittance in Vis and high reflectance in NIR region as well as good conductivity. Meanwhile, surface of the films was uniform, compact and crack-free. With incerasing of RF power, it was seen that crystallinity of the films improved and the grain size became larger. It was also observed that optical band gap of the films was increased to the order of 0.15 eV as well as decreasing the resistivity to the order of 6.38 Ω cm with increasing RF power from 100 to 200 W. Deposited film at 200 W, which can be optimum sputtering power for coating GZO films, having high concentration of free electrons and lowest resistivity exhibited the highest IR reflectivity (~55%) in NIR region. In addition, deposited GZO films at this power have larger particle size and highly optical transmittance (~87%) in visible region. Obtained both of optical and electrical results suggested that the deposited GZO films can be used in low thermal emissivity coating for energy efficient glass and the UV-blocking layer as well as transparent conductive oxide electrode for flexible opto-electronic devices.

Influence of Sputtering Power on Properties of ZnO Thin Films Fabricated by RF Sputtering in Room Temperature

Effect of Nucleation and Growth Kinetics on the Electrical and Optical Properties of Undoped ZnO Films

Deposition and Characterization of AZO Thin Films on Flexible Glass Substrates Using DC Magnetron Sputtering Technique

Microstructure and Optical Properties of ZnO Films Deposited by Radio-frequency Reactive Magnetron Sputtering

The Effects of Oxygen Partial Pressure and Substrate Temperature on the Structural and Optical Properties of Zno Films

Effects of DC Sputtering Power on the Properties of AZO Films Deposited at Room Temperature for CIGS Photovoltaics

Fabrication and Characteristics of ZnO Thin Films Deposited by RF Sputtering on Plastic Substrates for Flexible Display

Influences of the RF power ratio on the optical and electrical properties of GZO thin films by DC coupled RF magnetron sputtering at room temperature

Deposition and Characterization of Sputtered ZnO Films

Effects of RF power variation on properties of N-doped p-type ZnO thin films grown by plasma-assisted MOCVD

Effect of sputtering power on the microstructure and photelectric properties of Al doped ZnO thin films

Structural, optical and electrical properties of ZnO thin films prepared by reactive deposition

Deposition Condition Investigation of High c-axis Preferred Orientation ZnO Films Produced by RF Magnetron Sputtering

Physical and Optical Properties of ZnO Thin Films Grown by DC Sputtering Deposition

Crystal Growth of Undoped ZnO Films on Si Substrates under Different Sputtering Conditions

Effect of the Substrate Temperature on the Property of ZnO Films Deposited by Magnetron Sputtering with DC at the Low Power

Structures and Electric Properties of RF Sputtered ZnO Films

Effects of the electrochemical deposition conditions on the properties of ZnO polycrystalline thin film

STRUCTURAL AND OPTICAL STUDIES OF ZnO FILMS GROWN AT LOW TEMPERATURE

Influence of RF power on the opto-electrical and structural properties of gallium-doped zinc oxide thin films

Structural evolution of ZnO films deposited by rf magnetron sputtering on glass substrate