Physical and Optical Properties of ZnO Thin Films Grown by DC Sputtering Deposition

Tao Chen,Shu-Yi Liu,Christophe Detavernier,R. L. Van Meirhaegbe,Xin-Ping Qu
DOI: https://doi.org/10.1109/icsict.2008.4734639
2008-01-01
Abstract:The effects of the deposition condition of DC sputtering on the properties of ZnO thin films were systematic investigated. ZnO films have been prepared by DC sputtering on the Si and glass substrates in the Ar and O2/Ar ambient with different substrate temperature ranging from room temperature to 300°C. Optimal results of the ZnO film were obtained with a deposition temperature of 300°C in the O2/Ar ambient. The film has a preferential orientation of (002) and the Zn to O ratio is stoichiometric with a strong band-edge emission in the ultraviolet region. All the films deposited on glass have an optical transmittance over 80 % in the wavelength ranging from 400 nm to 800 nm.
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