Low temperature synthesis and formation mechanism of dense SiC coating layer by fluidized bed chemical vapor deposition
Ziliang WANG,Rongzheng LIU,Malin LIU,Jiaxing CHANG,Youlin SHAO,Bing LIU,Yongxin WANG
DOI: https://doi.org/10.13801/j.cnki.fhclxb.20151026.002
2016-01-01
Abstract:Usually,it requires extremely high temperature for preparation of SiC materials,so it is an important research direction for reducing the preparation temperature of SiC.SiC coating layer with a thickness of many mi-crons on the ZrO2 spherical ceramic particles was synthesized using the fluidized bed chemical vapor deposition meth-od.Through the study of microscopic morphology and microstructure change rule of SiC coating layer deposited at different temperatures,the deposition efficiency variation rule is obtained,and it is found that the low temperature product is silicon-rich,and the high-temperature product is carbon-rich.It is also found that the addition of argon can promote the deposition reaction toward to the carbon-rich direction by experimental study of different argon con-tents,so dense SiC coating layer can be prepared in the condition that the temperature is significantly reduced.Based on experimental results,the diagram map of SiC phase distribution with the variation of temperature and argon con-centration in the fluidized bed chemical vapor deposition system is also given.