Low Temperature Synthesis of Β-Sic by a Metal Vapor Vacuum Arc Ion Source

ZQ Liu,JF Liu,JY Feng,WZ Li
DOI: https://doi.org/10.1016/s0925-9635(01)00504-0
IF: 3
2001-01-01
Materials Letters
Abstract:β-SiC surface layers were synthesized by implantation of C+ into Si substrates at a comparatively low temperature of 400°C with a metal vapour vacuum arc ion source. X-ray diffraction patterns showed that these layers had a strong (111) preferred orientation. The amount of β-SiC formed increased significantly with the rise of the implantation dose, but the crystallinity of the layers formed relied little on the implantation dose. Both the broad X-ray diffraction peaks and the scanning electron microscopy photograph showed that the grain size of the sample with a dose of 7×1017 cm−2 is relatively small.
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