The microstructure and characteristics of luminescent porous silicon film prepared by the physicochemical sonic-vacating method

liu xiaobing,shi xianghua,liao taichang,ren peng,liu yue,liu yi,xiong zuhong,ding xunmin,hou xiaoyuan
DOI: https://doi.org/10.7498/aps.54.416
IF: 0.906
2005-01-01
Acta Physica Sinica
Abstract:The special physicochemical environment caused by sonic-vacating provides an important outlet for the preparation of highly efficient luminescent porous silicon films.Experimental results show that sonic-chemical treatment is an effective technology for the improvement of the microstructure of porous silicon,and the luminescent efficiency and stability thereof.Luminescent porous silicon films,prepared by ultrasonic-enhanced anode electrochemical etching,display better qualities than the samples prepared by conventionai methods widely used at present.This ultrasonic-chemical effect roots in sonic-vacating,i.e. the generation,formation and rapid collapse of bubbles in the etching solution.In the process of the porous silicon being etched,the escape rate and caving-in of hydrogen bubbles in the pores is increased as a result of the work of the ultrasonic waves,which is helpful to the vertical etching of the pores.
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