The research of the fabrication of Al/Al_2O_3/Al superconductor tunnel junctions by electron beam vapour

Zhang Jing,Xu Weiwei,Chang Lu,lu Yinhua,Chen Jian,Wu peiheng
DOI: https://doi.org/10.3969/j.issn.1001-7100.2009.02.007
2009-01-01
Abstract:Fabricating supeconductor Al film on Si substrate by electron beam vapour.The films with different thickness from 100nm to 500nm were measured by the methods of resistance-temperature and X-rays diffusion(XRD),and have the superconducting transition temperature of 1.2K.After successfully fabricating the Al film,we tried to fabricate Al/ Al2O3/Al tunnel junctions.Al film was fabricated by electron beam vapour.The insulated layer(Al2O3) could formed achieve by oxidating the surface of Al film.So it could prevent weakly connected efficiently.
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