Stress-impedance Effects in Layered FeSiB/Cu/FeSiB Films with a Meander Line Structure

Y Zhou,XH Mao,JA Chen,W Ding,XY Gao,ZM Zhou

DOI: https://doi.org/10.1016/j.jmmm.2004.11.139

IF: 3.097

2005-01-01

Journal of Magnetism and Magnetic Materials

Abstract:Stress-impedance (SI) effects were realized in layered FeSiB/Cu/FeSiB films with a meander line structure by magnetron sputtering on thin glass substrate. The SI effects were studied in the frequency range of 1–40MHz for the layered FeSiB/Cu/FeSiB films with different film thickness of FeSiB film and Cu layer. Experimental results show that the values of SI ratio increase nearly linear with the deflection of the layered FeSiB/Cu/FeSiB films at high frequencies, and a large negative SI ratio of -18.3% at a frequency of 25MHz with the deflection of 1000μm is obtained in the layered FeSiB/Cu/FeSiB films with a thicker FeSiB film, which is very attractive for the applications of stress sensors.