Abstract:The influence of M1 (lower level Cu) line width on stress-induced voiding (SIV) behavior of copper dual damascene interconnects was investigated by stress migration test at 200 degrees C and finite element analysis (FEA). M I line width under study ranged from 200 run to 1000 nm, whereas the M2 line width was fixed to be 3 mu m. The normalized change in resistance indicated that the via-line structures with larger M1 line width were more susceptible to SIV Failure analysis utilizing focus ion beam (FIB) showed that voids were fon-ned in the via bottom region for samples with M I line width less than 280 nm. However, voids were found at the Si3N4/M1 Cu interface near the via bottom if M I line width is larger than 280 nm.To further understand the underlying physics of SIV, three dimensional finite element models were built to Simulate the hydrostatic stress distribution in the via-line structures. It was found that the stress gradient in the length direction, grad sigma(1), was not sensitive to M1 line width, however, the stress gradient in the line width direction, grad sigma(w), was found to increase with M I line widths. It is thus proposed that in addition to the active diffusion volume, it is the grad sigma(w) that further favors the migration of voids (or vacancies) along the Si3N4/M1 Cu interface and subsequent accumulation of the voids near the via bottom leading to a much higher resistance change at larger M1 widths. (c) 2005 Elsevier B.V. All rights reserved.

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Interface Constraint Effect and Stress Relaxation in Nano-Sandwiched Thin Film

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Effect of Sputtering Parameters and Sample Size on Giant Magnetoimpedance Effect in Nife and Nife/Cu/Nife Films

Influence of Annealing Conditions on the Stress Impedance Effect of FeCoSiB Magnetoelastic Thin Films

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Thickness Effects on Microwave Magnetic Properties of FeCoBSi Films Deposited on Flexible Substrate