Physical modeling for photo-capacitance characteristics of metal oxide TFTs
Haoyang Li,Wencai Zuo,Feifan Li,Zhaohua Zhou,Miao Xu,Lei Wang,Weijing Wu,Junbiao Peng
DOI: https://doi.org/10.1063/5.0185267
IF: 1.697
2024-01-01
AIP Advances
Abstract:We propose an amorphous metal oxide thin film transistor photo-capacitance model in the depletion region that takes Fermi level splitting and band-bending rearrangement into consideration. The split Fermi level is used to characterize the variation in trapped electrons under illumination. Those trapped electrons are excited by optical energy transport under the electric field induced by gate voltage, changing the charge density in the space charge and inducing the rearrangement of band bending. By comparing the data calculated from the model with the test data under three different illumination conditions, that is, 808, 635, and 520 nm, we verify the correctness of this model. Furthermore, the fitting results were in accordance with the general law: the higher the photon energy, the higher the energy level splitting.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology