Microscopic model for the nonlinear behavior of high-k metal-insulator-metal capacitors

Ch. Wenger,G. Lupina,M. Lukosius,O. Seifarth,H.-J. Müssig,S. Pasko,Ch. Lohe
DOI: https://doi.org/10.1063/1.2919573
IF: 2.877
2008-05-15
Journal of Applied Physics
Abstract:The achievement of sufficient capacitance-voltage linearity in metal-insulator-metal (MIM) capacitors with high permittivity (high-k) dielectrics is still a challenge, as the origin of the nonlinear behavior is still unclear. Based on fundamental physical mechanisms, such as electrostriction, Coulomb interaction between electrodes, and nonlinear optical effects, a microscopic model, which describes the nonlinearities in capacitance-voltage characteristics of high-k MIM capacitors, will be presented. The extended model, which includes stacked high-k dielectrics and interfacial layers, is able to predict the quadratic voltage capacitance coefficients as a function of the dielectric constant. The calculated coefficients are in suitable agreement with the experimental values of Al2O3-, Y2O3-, HfO2-, and Pr2Ti2O7-based MIM capacitors.
physics, applied
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