Characterization of a nanocrystal metal-oxide-semiconductor field effect transistor(MOSFET)

MA Yuan,YOU Li-ping,ZHANG Xiao-ping,YU Da-peng
DOI: https://doi.org/10.3969/j.issn.1000-6281.2007.02.005
2007-01-01
Abstract:Si Quantum dots(Ti doped) have been formed by self-assembled growth on SiO_2 surfaces using the low pressure chemical vapor deposition(LPCVD) with two step annealing.High resolution transmission electron microscopy(HRTEM),energy dispersive spectrum(EDS) and scanning transmission electron microscopy(STEM) were used to characterize the cross sectional samples.Composition information reveals the dopant distribution within the quantum dots.Relative experimrntal results which validate structure model of the Quantum dots MOSFET are consistent with each other.
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