Electrical Characteristics of SiO2/crystalline Si Quantum Dots/sio2 Double-Barrier Diode

Xiaofeng Gu,Hua Qin,Hai Lu,Kunji Chen,Xinfan Huang
DOI: https://doi.org/10.1016/s0022-3093(98)00282-8
IF: 4.458
1998-01-01
Journal of Non-Crystalline Solids
Abstract:We report the fabrication, structure characteristics and vertical transport properties of SiO2/crystalline Si quantum dots/SiO2 double-barrier diodes in this paper. a-Si:H films of 20 nm thick were deposited using a high hydrogen dilution silane plasma enhanced chemical vapor deposition system; then the films are thermally crystallized and simultaneously oxidized. Cross-section and high resolution transmission electron microscopy photographs indicate the formation of SiO2 barrier layers and crystalline Si quantum dots structures. The vertical electrical characteristics of these diodes exhibit a series of unique conductance maxima at room temperature. The real voltage spacing between adjacent maxima (∼1 V) is in good agreement with the calculated results based on the model of Coulomb blockade effect.
What problem does this paper attempt to address?