Defect Influence on the Electrical Properties of 4H-SiC Schottky Diodes

Chen Gang,Chen Xuelan,Bai Song,Li Zheyang,Han Ping
2008-01-01
Abstract:The defect influence of n-type 4H-SiC epitaxial layer on the electrical properties of Ti/4H-SiC Schottky barrier diode(SBD)was reported.The wafer is commercially available.The surface,defect and the polytype of the 2 cm×2 cm SiC epilayer were anlyzed with the measurements of SEM,AFM and Raman spectrum.The 4H-SiC epitaxial layer was grown on the commercially available 8°off-oriented Si-face(0001)single-crystal 4H-SiC wafers.Ti/4H-SiC SBDs with the diameter of 110 μm and blocking voltage of 650 V were made on a low n-doped epilayer with a thickness of 10 μm and 5×1015 cm-3 in carrier density.The ideality factor n=1.24 and the effective barrier height =0.85 V of the Ti/4H-SiC SBDs are measured with method of forward density-voltage.
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