H-ion Irradiation-induced Annealing in He-ion Implanted 4H-Sic
Yi Han,Bing-Sheng Li,Zhi-Guang Wang,Jin-Xin Peng,Jian-Rong Sun,Kong-Fang Wei,Cun-Feng Yao,Ning Gao,Xing Gao,Li-Long Pang,Ya-Bin Zhu,Tie-Long Shen,Hai-Long Chang,Ming-Huan Cui,Peng Luo,Yan-Bin Sheng,Hong-Peng Zhang,Xue-Song Fang,Si-Xiang Zhao,Jin,Yu-Xuan Huang,Chao Liu,Dong Wang,Wen-Hao He,Tian-Yu Deng,Peng-Fei Tai,Zhi-Wei Ma
DOI: https://doi.org/10.1088/0256-307x/34/1/012801
2017-01-01
Chinese Physics Letters
Abstract:Radiation-induced defect annealing in He+ ion-implanted 4H-SiC via H+ ion irradiation is investigated by Raman spectroscopy. There are 4H-SiC wafers irradiated with 230 keV He+ ions with fluences ranging from 5.0x10(15) cm(-2) to 2.0 x 10(16) cm(-2) at room temperature. The post-implantation samples are irradiated by 260 keV H+ ions at a fluence of 5.0 x 10(15) cm(-2) at room temperature. The intensities of Raman lines decrease after He implantation, while they increase after H irradiation. The experimental results present that the magnitude of Raman line increment is related to the concentration of pre-existing defects formed by He implantation. A strong new peak located near 966 cm(-1), which is assigned to 3C-SiC LO (Gamma) phonon, is found in the He-implanted sample with a fluence of 5.0 x 10(15) cm(-2) followed by H irradiation. However, for the He-implanted sample with a fluence of 2.0 x 10(16) cm(-2) followed by H irradiation, no 3C-SiC phonon vibrations are found. The detailed reason for H irradiation-induced phase transformation in the He-implanted 4H-SiC is discussed.