Reflection Electron Microscopy Imaging of GaAs/AlxGa1−xAs Multilayer Materials

LM PENG,AY DU,J JIANG,XC ZHOU
DOI: https://doi.org/10.1080/09500839208206007
IF: 1.195
1992-01-01
Philosophical Magazine Letters
Abstract:The technique of reflection electron microscopy has been applied to the imaging of GaAs/AlxGa1-xAs multilayer materials. The image contrast of the multilayer materials is shown to result mainly from the composition variation across the structures. We demonstrated that, by using surface resonance effects, an AlxGa1-xAs epitaxial layer with 1.0% Al can be identified, and a multiple-quantum-well structure with periodicity down to 20 angstrom can be imaged.
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