Substrate-induced strain in 2D layered GaSe materials grown by molecular beam epitaxy
Cheng-Wei Liu,Jin-Ji Dai,Ssu-Kuan Wu,Nhu-Quynh Diep,Sa-Hoang Huynh,Thi-Thu Mai,Hua-Chiang Wen,Chi-Tsu Yuan,Wu-Ching Chou,Ji-Lin Shen,Huy-Hoang Luc
DOI: https://doi.org/10.1038/s41598-020-69946-4
IF: 4.6
2020-07-31
Scientific Reports
Abstract:Abstract Two-dimensional (2D) layered GaSe films were grown on GaAs (001), GaN/Sapphire, and Mica substrates by molecular beam epitaxy (MBE). The in situ reflective high-energy electron diffraction monitoring reveals randomly in-plane orientations of nucleated GaSe layers grown on hexagonal GaN/Sapphire and Mica substrates, whereas single-orientation GaSe domain is predominant in the GaSe/GaAs (001) sample. Strong red-shifts in the frequency of in-plane $${E}_{2g}^{2}$$ E 2 g 2 vibration modes and bound exciton emissions observed from Raman scattering and photoluminescence spectra in all samples are attributed to the unintentionally biaxial in-plane tensile strains, induced by the dissimilarity of symmetrical surface structure between the 2D-GaSe layers and the substrates during the epitaxial growth. The results in this study provide an important understanding of the MBE-growth process of 2D-GaSe on 2D/3D hybrid-heterostructures and pave the way in strain engineering and optical manipulation of 2D layered GaSe materials for novel optoelectronic integrated technologies.
multidisciplinary sciences