Assessment of the Structural Properties of Gaas/Si Epilayers Using X-Ray (004) and (220) Reflections

MS Hao,YT Wang,CL Shao,TS Soga,JW Liang,T Jimbo,M Umeno
DOI: https://doi.org/10.1143/jjap.35.6017
1996-01-01
Abstract:We improved the method previously used to determine the lattice constants and misorientation of GaAs/Si by recording the patterns of X-ray (004) and (220) reflections. The (220) reflection was measured from the (110) cross section of a GaAs/Si epilayer. The structural properties of the GaAs/Si epilayers grown by metal-organic chemical-vapor deposition (MOCVD) using an ultrathin a-Si buffer layer were investigated. The rotation angle of GaAs/Si epilayers grown by MOCVD using an a-Si buffer layer is very small and the lattice constants of these GaAs/Si epilayers agree quite well with elastic theory.
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