Orthogonal optimization the technique parameters made by the 50μm/50μm fine line

HE Jie,HE Wei,HUANG Yu-xin,FENG Li,XU Huan,ZHOU Hua,LUO Xu,DAI Guan-jun
DOI: https://doi.org/10.3969/j.issn.1009-0096.2013.03.008
2013-01-01
Abstract:The minimum line width of HDI in company batch production is 75μm/75μm.Based on the capacity,the fine line with the width of 50μm/50μm was made.In the study L9(34)orthogonal arrangement was used to take the orthogonal experiment and four factors included,etching speed,developing speed,etching pressure and developing pressure.Meanwhile,the line width and etching factor were chosen as experimental indexes.After comprehensive consideration of the two experimental indexes,the optimum technique parameters were obtained in the study,the rate of developing is 4.0m/min,the above and below pressure of the developing is 1.8MPa and 1.5MPa,respectively.The rate of etching is 4.5m/min,the above and below pressure of etching is 2.8MPa and 2.5MPa,respectively.
What problem does this paper attempt to address?