Temperature Characterization of Raman Scattering in an AlGaN/GaN Heterostructure

D.J. Chen,B. Shen,X.L. Wu,J.C. Shen,F.J. Xu,K.X. Zhang,R. Zhang,R.L. Jiang,Y. Shi,Y.D. Zheng
DOI: https://doi.org/10.1007/s00339-003-2456-2
2004-01-01
Abstract:Raman scattering from an AlGaN/GaN heterostructure was performed in the temperature range from 77 to 773 K. The first- and second-order Raman scattering of the A1 longitudinal-optical phonon–plasmon coupled mode from an AlGaN/GaN interface as well as the Raman scattering from the GaN layer were observed. All the modes downshift, and their intensities weaken with increasing temperature. The free-carrier concentration estimated by the frequency of the coupled mode from an AlGaN/GaN interface is 7.5 times as high as that of n-AlGaN, indicating mass free-carrier transfer from the AlGaN barrier to the GaN well. Moreover, the temperature dependence of the phonon frequency is well described by an empirical formula.
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