Design and Virtual Fabrication Process of a New Kind of Capacitive Accelerometer

JIN Tong,ZHAO Xin,TAN Yi-yong,SUN Guang-yi,LU Gui-zhang
DOI: https://doi.org/10.3969/j.issn.1004-1699.2006.05.229
2006-01-01
Abstract:Capacitive accelerometer can be regarded as the main direction of the development of silicon micro-accelerometer currently. Based on silicon/glass anodic bonding technology and inductively coupled plasma (ICP) high aspect ratio etching ,this paper proposes a new kind of the capacitive accelerometer which combined two methods of changing parallel capacitance effectively. With the knowledge of Virtual Fabrication Process theory, the validity of the design is proved by simulative result of fabrication . This accelerometer fabricated with this technology shows a high sensitivity and has excellent linear coefficient. The design achievement were concluded and The direction of the future work was discussed.
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