Fabrication of A Nano-Scale Gap by Selective Chemical Deposition

L Huang,L Xu,HQ Zhang,N Gu

DOI: https://doi.org/10.1039/b109189c

IF: 4.9

2001-01-01

Chemical Communications

Abstract:An electrode nanogap of 45 nm has been prepared by a new method in which the initial gap of 1-2 microns obtained by conventional lithography was shortened by selective chemical deposition of copper onto the electrodes.

What problem does this paper attempt to address?

Electrochemical Approach for Fabricating Nanogap Electrodes with Well Controllable Separation

F Chen,Q Qing,L Ren,ZY Wu,ZF Liu

DOI: https://doi.org/10.1063/1.1871361

IF: 4

2005-01-01

Applied Physics Letters

Abstract:An electrochemical technique for fabricating nanogaps is proposed, which utilizes an in situ gap-impedance-tuning mechanism to realize precise control of gap separation. Nanogap electrodes with gap separation from tens of nanometer to sub 10 nm have been fabricated by combining conventional photolithography and this controlled electrodeposition technique. The gap separation can be tuned by changing monitoring parameters based on a homemade electrochemical setup, which provides high sensitivity and reproducibility. In addition, a possible mechanism for controlling gap separation at tens of nanometer level at present conditions was discussed.
Fabrication of nanogap metal electrode with sacrificial layer techniques

Kan Yu,Xiaofei Wang,Xiaomei Yu,Andi Zhao

DOI: https://doi.org/10.1109/NEMS.2011.6017554

2011-01-01

Abstract:Two simple lithography-independent methods by underetching the metal and using SiO2 sidewall as sacrificial spacer to fabricate nanogap electrodes are demonstrated in this work. In the first method, by wet etching the metal layer after lithography and using the undeveloped photoresist (PR) as the sacrificial layer of the subsequent second metal lift-off process, a metal electrode with nanogap was fabricated. The width of the metal gap is mainly defined by the overetch under the PR. For the sidewall method, first depositing a conformal SiO2 layer on a polysilicon pattern and then etching back the SiO2 layer on the polysilicon, a sacrificial spacer is obtained after selectively remove the polysilicon. At last, a metal nanogap was fabricated after the metal sputtering and lift-off process. The width of the metal gap is mainly determined by the thickness of conformal SiO2 layer. With the conventional lithography methods, metal electrode with the gap width smaller than 100nm can be obtained.
Lithography-Independent and Large Scale Fabrication of A Metal Electrode Nanogap

Li Yan,Wang Xiaofeng,Zhang Jiayong,Wang Xiaodong,Fan Zhongchao,Yang Fuhua

DOI: https://doi.org/10.1088/1674-4926/30/9/096003

2009-01-01

Journal of Semiconductors

Abstract:A lithography-independent and wafer scale method to fabricate a metal nanogap structure is demonstrated. Polysilicon was first dry etched using photoresist (PR) as the etch mask patterned by photolithography. Then, by depositing conformal SiO2 on the polysilicon pattern, etching back SiO2 anisotropically in the perpendicular direction and removing the polysilicon with KOH, a sacrificial SiO2 spacer was obtained. Finally, after metal evaporation and lifting-off of the SiO2 spacer, an 82 nm metal-gap structure was achieved. The size of the nanogap is not determined by the photolithography, but by the thickness of the SiO2. The method reported in this paper is compatible with modern semiconductor technology and can be used in mass production.
Fabrication of Sub-10 Nm Gap by Using Electron Beam Lithography

Bingnan Yan,Xuecou Tu,Chen Zhang,Wohu Wang,Ziyao Ye,Xiaoqing Jia,Lin Kang,Peiheng Wu

DOI: https://doi.org/10.1109/ivec56627.2023.10156935

2023-01-01

Abstract:Nanogap is an important research tool in the field of sensitive photoelectric sensors. Based on the surface plasmon resonance effect, the local electromagnetic field generated by the interaction between light and matter in the nanogap will be greatly enhanced, which can realize more applications of nano-functional devices. Fabricating sub-10 nm nanogaps precisely is a difficult and laborious work due to the operational accuracy of the Electron beam lithography (EBL). In this work, we propose a new manufacturing process for the nanogap electrode pairs. The shape and size of electrode pairs were set overlapping/zero spacing/non-overlapping strategy in the layout pattern at different angles. By using electron beam evaporation technology, the adhesions of electrode pair tips with sub-10 nm gaps were mitigated. Our study demonstrates a reliable manufacturing process for sub-10 nm gaps.
Fabrication of nanometer-spaced electrodes using gold nanoparticles

Saiful I. Khondaker,Zhen Yao

DOI: https://doi.org/10.1063/1.1528285

IF: 4

2002-12-09

Applied Physics Letters

Abstract:A simple and highly reproducible technique is demonstrated for the fabrication of metallic electrodes with nanometer separation. Commercially available bare gold colloidal nanoparticles are first trapped between prefabricated large-separation electrodes to form a low-resistance bridge by an ac electric field. A large dc voltage is then applied to break the bridge via electromigration at room temperature, which consistently produces gaps in the sub-10 nm range. The technique is readily applied to prefabricated electrodes with separation up to 1 μm, which can be defined using optical lithography. The simple fabrication scheme will facilitate electronic transport studies of individual nanostructures made by chemical synthesis. As an example, measurement of a thiol-coated gold nanoparticle showing a clear Coulomb staircase is presented.

physics, applied
Electrochemical Fabrication of Nanoporous Gold

Cheng Fang,Narasimha Murthy Bandaru,Amanda Vera Ellis,Nicolas Hans Voelcker

DOI: https://doi.org/10.1039/c2jm14889g

2012-01-01

Journal of Materials Chemistry

Abstract:We demonstrate the electrochemical etching of gold in a solution of hydrofluoric acid and dimethylformamide (DMF) to fabricate nanoporous gold (NpAu) films. Compared to de-alloyed NpAu, the electrochemically etched NpAu exhibits controllable pore size and etching depth by adjusting the etching conditions. We propose an etching mechanism where the organic electrolyte DMF protects the nascent gold pore walls by slowing the dissolution of gold oxide. At the same time, localized reactions occurring at the gold electrode surface focus the etching current for etching into depth. We further modify the as-prepared NpAu surface with single walled carbon nanotubes (SWCNTs) and use the nanotube-decorated surface as an electrochemical sensor to detect bisphenol A, an endocrine disruptor chemical. A 100 nM limit of detection is achieved by combining the catalytic capacity of SWCNTs with the specific surface area of a NpAu electrode.
Fabrication of Sub-Nanometer Pores on Graphene Membrane for Ion Selective Transport

Han Qi,Zhongwu Li,Yi Tao,Weiwei Zhao,Kabin Lin,Zhenhua Ni,Chuanhong Jin,Yan Zhang,Kedong Bi,Yunfei Chen

DOI: https://doi.org/10.1039/c8nr00050f

IF: 6.7

2018-01-01

Nanoscale

Abstract:The ability to sieve ions through nanopores with high throughput has significant importance in seawater desalination and other separation applications. In this study, a plasma etching process has been demonstrated to be an efficient way to produce high-density nanopores on graphene membranes with tunable size in the sub-nanometer range. Besides the pore size, the nanopore density is also controllable through adjusting the exposure time of the sample to argon or oxygen plasma. The plasma-treated graphene membranes can selectively transport protons, Na+ and Cl- ions. Density function theory calculations uncover that the sp3 and vacancy-type defects construct different energy barriers for different ions, which allow the defected graphene membrane to selectively transport ions. Our study indicates that oxygen plasma etching can be used as a very convenient and efficient method for fabricating a monolayer filtration graphene membrane with tunable sub-nanometer pores.
Fabrication of ZnO Nanowire Devices Via Selective Electrodeposition

Min Zhang,Zhaoying Zhou,Xing Yang,Xiongying Ye,Zhong Lin Wang

DOI: https://doi.org/10.1149/1.2943658

2008-01-01

Electrochemical and Solid-State Letters

Abstract:We introduce a solution-based electrodeposition technique that selectively deposits copper only at the contacts between nanowires/nanobelts/nanotubes and the electrodes, while leaving the device surfaces clean. This was achieved using a copper nitrate bath with low covering power. Our method demonstrates an effective, parallel process for achieving stable electric and mechanical contacts for one-dimensional nanomaterial-based devices on a large scale. (C) 2008 The Electrochemical Society.
High-yield fabrication of nm-size gaps in monolayer CVD graphene.

Cornelia Nef,László Pósa,Péter Makk,Wangyang Fu,András Halbritter,Christian Schönenberger,Michel Calame

DOI: https://doi.org/10.1039/c4nr01838a

IF: 6.7

2014-01-01

Nanoscale

Abstract:Herein we demonstrate the controlled and reproducible fabrication of sub-5 nm wide gaps in single-layer graphene electrodes. The process is implemented for graphene grown via chemical vapor deposition using an electroburning process at room temperature and in vacuum. A yield of over 95% for the gap formation is obtained. This approach allows producing single-layer graphene electrodes for molecular electronics at a large scale. Additionally, from Raman spectroscopy and electroburning carried out simultaneously, we can follow the heating process and infer the temperature at which the gap formation happens.
Molecular crystal lithography: a facile and low-cost approach to fabricate nanogap electrodes.

Lang Jiang,Huanli Dong,Qing Meng,Jiahui Tan,Wei Jiang,Cuiying Xu,Zhaohui Wang,Wenping Hu

DOI: https://doi.org/10.1002/adma.201103098

IF: 29.4

2012-01-01

Advanced Materials

Abstract:A novel cost-efficient and facile technique, molecular crystal lithography, to fabricate nanogap electrodes efficiently is reported. The gap width of the electrodes can be tuned from similar to 9 nm to several micrometers. Organic field-effect transistors based on the nanogap electrodes all exhibit a high performance, indicating the effectiveness and practicability of molecular crystal lithography for mass production of nanogap electrodes.
Electrochemical Fabrication of Atomically Thin Metallic Wires and Electrodes Separated with Molecular-Scale Gaps

HX He,S Boussaad,BQ Xu,CZ Li,NJ Tao

DOI: https://doi.org/10.1016/s0022-0728(02)00692-7

IF: 4.598

2002-01-01

Journal of Electroanalytical Chemistry

Abstract:This article summarizes our recent effort to fabricate electrochemically metallic nanowires and electrodes separated with molecular scale nanogaps. The nanowires were fabricated by etching a small portion of a micron-scale metallic wire supported on a solid substrate. The etching was controlled by continuously monitoring the conductance of the wire. When the thinnest portion of the wire reached the atomic scale, the conductance decreased in a stepwise fashion. By further etching away the last few atoms, a molecular-scale gap between two electrodes was created and the ballistic electron transport through the nanowire was replaced with quantum tunneling. By depositing atoms back, the above processes could be reversed, allowing us to achieve a desired nanowire or gap. The nanowires may be used for chemical sensor applications and the nanogaps may be used to wire small molecules to the outside world for molecular electronics applications.
Finely Tuning Metallic Nanogap Size with Electrodeposition by Utilizing High‐Frequency Impedance in Feedback

Q Qing,F Chen,PG Li,WH Tang,ZY Wu,ZF Liu

DOI: https://doi.org/10.1002/anie.200502680

2005-01-01

Angewandte Chemie

Abstract:Positive feedback: Relatively large gaps can be reproducibly fabricated by utilizing the change in impedance arising from the high electric field between the electrodes in a feedback-controlled electrodeposition system. Furthermore, the gap size can be finely tuned down to around 1 nm by simply controlling subsequent deposition time (see SEM images). Supporting information for this article is available on the WWW under http://www.wiley-vch.de/contents/jc_2002/2005/z502680_s.pdf or from the author. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
Chemical fabrication of heterometallic nanogaps for molecular transport junctions.

Xiaodong Chen,Sina Yeganeh,Lidong Qin,Shuzhou Li,Can Xue,Adam B Braunschweig,George C Schatz,Mark A Ratner,Chad A Mirkin

DOI: https://doi.org/10.1021/nl9018726

IF: 10.8

2009-01-01

Nano Letters

Abstract:We report a simple and reproducible method for fabricating heterometallic nanogaps, which are made of two different metal nanorods separated by a nanometer-sized gap. The method is based upon on-wire lithography, which is a chemically enabled technique used to synthesize a wide variety of nanowire-based structures (e.g., nanogaps and disk arrays). This method can be used to fabricate pairs of metallic electrodes, which exhibit distinct work functions and are separated by gaps as small as 2 nm. Furthermore, we demonstrate that a symmetric thiol-terminated molecule can be assembled into such heterometallic nanogaps to form molecular transport junctions (MTJs) that exhibit molecular diode behavior. Theoretical calculations demonstrate that the coupling strength between gold and sulfur (Au-S) is 2.5 times stronger than that of Pt-S. In addition, the structures form Raman hot spots in the gap, allowing the spectroscopic characterization of the molecules that make up the MTJs.
Formation of Nanogaps by Nanoscale Cu Electrodeposition and Dissolution

Fang Chen,Quan Qing,Liang Ren,Lianming Tong,Zhongyun Wu,Zhongfan Liu

DOI: https://doi.org/10.1016/j.electacta.2006.11.041

IF: 6.6

2006-01-01

Electrochimica Acta

Abstract:We utilize an ac feedback signal to control the size of Cu nanogaps by electrochemically depositing or dissolving copper onto pre-patterned electrodes. The ac frequency in this work was set to 820Hz, at which the capacitive reactance contributes notably to the gap impedance. As a result, distinct changes can be observed in the monitored signals at relatively large gap size, as compared with the high sensitivity of resistive reactance to small gap distance when the frequency is set lower. Within the present parameter, we have prepared nanoscale gaps ranging from tens of nm to sub-10nm by carefully choosing the subsequent deposition or dissolution time.
Nanomanufacturing of Graphene Nanosheets Through Nano-Hole Opening and Closing

Yanan Chen,Yilin Wang,Shuze Zhu,Kun Fu,Xiaogang Han,Yanbin Wang,Bin Zhao,Tian Li,Boyang Liu,Yiju Li,Jiaqi Dai,Hua Xie,Teng Li,John W. Connell,Yi Lin,Liangbing Hu

DOI: https://doi.org/10.1016/j.mattod.2018.09.001

IF: 24.2

2018-01-01

Materials Today

Abstract:Facile and scalable fabrication of highly dense and high-quality graphene films and articles is extremely attractive for a range of electronic and mechanical applications. Pristine, high-quality graphene with its inherent impermeability poses challenges in fabricating dense films and thick parts with high electrical conductivity due to the difficulty in removing trapped air and/or solvents used in various fabrication methods. To overcome this deficiency, nano-holes were intentionally created in pristine graphene ("holey graphene") with an average diameter of approximately 15 nm. The holes serve as pathways for the rapid removal of gases or liquids and enable the fabrication of dense holey graphene nanostructures. Subsequently, a high-temperature process is applied to effectively repair the nano-holes and recover the high-quality graphene conjugated network. Through the creation and repair of the nano-holes, dense graphene articles that exhibited an ultrahigh conductivity of 2209 S/cm and superior thermal conductivity of 863 W/mK were created. This unique processing methodology enables the facile and scalable fabrication of high-quality graphene constructs, which can be easily integrated into the next generation of electronic circuits and high-power battery systems for highly efficient and lightweight thermal management.
Fabricating Atom-Sized Gaps by Field-Aided Atom Migration in Nanoscale Junctions

Ran Liu,Jun-Jie Bi,Zhen Xie,Kaikai Yin,Dunyou Wang,Guang-Ping Zhang,Dong Xiang,Chuan-Kui Wang,Zong-Liang Li

DOI: https://doi.org/10.1103/PhysRevApplied.9.054023

IF: 4.6

2018-01-01

Physical Review Applied

Abstract:The gap sizes between electrodes generated by typical methods are generally much larger than the dimension of a common molecule when fabricating a single-molecule junction, which dramatically suppresses the yield of single-molecule junctions. Based on the ab initio calculations, we develop a strategy named the field-aided method to accurately fabricate an atomic-sized gap between gold nanoelectrodes. To understand the mechanism of this strategy, configuration evolutions of gold nanojunction in stretching and compressing processes are calculated. The numerical results show that, in the stretching process, the gold atoms bridged between two electrodes are likely to form atomic chains. More significantly, lattice vacant positions can be easily generated in stretching and compressing processes, which make field-aided gap generation possible. In field-aided atom migration (FAAM), the external field can exert driving force, enhance the initial energy of the system, and decrease the barrier in the migration path, which makes the atom migration feasible. Conductance and stretching and compressing forces, as measurable variables in stretching and compressing processes, present very useful signals for determining the time to perform FAAM. Following this desirable strategy, we successfully fabricate gold nanogaps with a dimension of 0.38 +/- 0.05 nm in the experiment, as our calculation simulates.
Development of Research on Fabrication of Nanometer-spaced Electrodes

顾宁,黄岚,徐丽娜,王孟,廖建辉

2003-01-01

Abstract:The main developments of the research in fabrication of nanometer-spaced electrodes abroad and at home are introduced.Especially,a new technology to produce the electrodes by combining the selective chemical deposition with common lithography is described and the following related research subjects are discussed.The Ni double-electrodes with the separation of less than 100 nm have been fabricated by that technology.The technology has some advantages for fabricating the nanometer-spaced electrodes.
Precise Fabrication of Uniform Molecular Gaps for Active Nanoscale Devices

Farnaz Niroui,Mayuran Saravanapavanantham,Jinchi Han,Jatin J. Patil,Timothy M. Swager,Jeffrey H. Lang,Vladimir Bulović

DOI: https://doi.org/10.48550/arXiv.2006.14992

2020-06-26

Abstract:Molecules with versatile functionalities and well-defined structures, can serve as building blocks for extreme nanoscale devices. This requires their precise integration into functional heterojunctions, most commonly in the form of metal-molecule-metal architectures. Structural damage and nonuniformities caused by current fabrication techniques, however, limit their effective incorporation. Here, we present a hybrid fabrication approach enabling uniform molecular gaps. Template-stripped lithographically-patterned gold electrodes with sub-nanometer roughness are used as the bottom contacts upon which the molecular layer is formed through self-assembly. The top contacts are assembled using dielectrophoretic trapping of colloidal gold nanorods, resulting in uniform sub-5 nm junctions. In these electrically-active designs, we further explore the possibility of mechanical tunability. The presence of molecules may help control sub-nanometer mechanical modulation which is conventionally difficult to achieve due to instabilities caused by surface adhesive forces. Our approach is versatile, providing a platform to develop and study active molecular gaps towards functional nanodevices.

Applied Physics,Mesoscale and Nanoscale Physics
A Method for Micropipette-Based Meniscus-Confined Electrodeposition of Microstructures Without Nozzle Clogging

Yutao Wang,Yuan-Liu Chen,Yuyang Wang,Bing-Feng Ju

DOI: https://doi.org/10.1007/s41871-020-00058-3

2020-01-01

Nanomanufacturing and Metrology

Abstract:Local electrodeposition by using a micropipette is a potential method for fabrication of 3D metallic micro/nano-structures by confining the electrochemical reaction in a liquid meniscus, which is formed between the nozzle of the micropipette and a substrate. One of the key problems associated with this method is the nozzle clogging due to the small size of the micropipette, where the nozzle aperture is on the order of 1 μm and the fast speed of electrochemical reaction. This paper presents a method for resolving the nozzle clogging problem inherently with the local electrodeposition of microstructures. The reason of micrometric nozzle clogging was firstly investigated. A new method by relieving the nozzle deformation as well as adjusting the liquid meniscus bridge during the electrodeposition procedure was proposed. Through this way, electrodeposition of microstructures could thus be carried out with a high reproductivity without influences of the nozzle clogging. Experiments were carried out to demonstrate the feasibility of the method. It is proved that the reproductivity, the nozzle condition, as well as the surface quality of the microstructures in local electrodeposition could be improved based on the proposed method.
Fabrication of Asymmetric Electrode Pairs with Nanometer Separation Made of Two Distinct Metals

Mandar M. Deshmukh,Amy L. Prieto,Qian Gu,Hongkun Park

DOI: https://doi.org/10.1021/nl034538p

2003-09-16

Abstract:We report a simple and reproducible method to fabricate two metallic electrodes made of different metals with a nanometer-sized gap. These electrodes are fabricated by defining a pair of gold electrodes lithographically and electrodepositing a second metal onto one of them. The method enables the fabrication of pairs of metallic electrodes that exhibit distinct magnetic properties or work functions. The utility of this technique is demonstrated by making single-electron tunneling devices incorporating 2-nm gold nanocrystals.

Mesoscale and Nanoscale Physics

Fabrication of A Nano-Scale Gap by Selective Chemical Deposition

Electrochemical Approach for Fabricating Nanogap Electrodes with Well Controllable Separation

Fabrication of nanogap metal electrode with sacrificial layer techniques

Lithography-Independent and Large Scale Fabrication of A Metal Electrode Nanogap

Fabrication of Sub-10 Nm Gap by Using Electron Beam Lithography

Fabrication of nanometer-spaced electrodes using gold nanoparticles

Electrochemical Fabrication of Nanoporous Gold

Fabrication of Sub-Nanometer Pores on Graphene Membrane for Ion Selective Transport

Fabrication of ZnO Nanowire Devices Via Selective Electrodeposition

High-yield fabrication of nm-size gaps in monolayer CVD graphene.

Molecular crystal lithography: a facile and low-cost approach to fabricate nanogap electrodes.

Electrochemical Fabrication of Atomically Thin Metallic Wires and Electrodes Separated with Molecular-Scale Gaps

Finely Tuning Metallic Nanogap Size with Electrodeposition by Utilizing High‐Frequency Impedance in Feedback

Chemical fabrication of heterometallic nanogaps for molecular transport junctions.

Formation of Nanogaps by Nanoscale Cu Electrodeposition and Dissolution

Nanomanufacturing of Graphene Nanosheets Through Nano-Hole Opening and Closing

Fabricating Atom-Sized Gaps by Field-Aided Atom Migration in Nanoscale Junctions

Development of Research on Fabrication of Nanometer-spaced Electrodes

Precise Fabrication of Uniform Molecular Gaps for Active Nanoscale Devices

A Method for Micropipette-Based Meniscus-Confined Electrodeposition of Microstructures Without Nozzle Clogging

Fabrication of Asymmetric Electrode Pairs with Nanometer Separation Made of Two Distinct Metals