Abstract:The fabrication of large-area and flexible nanostructures currently presents various challenges related to the special requirements for 3D multilayer nanostructures, ultrasmall nanogaps, and size-controlled nanomeshes. To overcome these rigorous challenges, a simple method for fabricating wafer-scale, ultrasmall nanogaps on a flexible substrate using a temperature above the glass transition temperature (<i>T</i>g) of the substrate and by layer-by-layer nanoimprinting is proposed here. The size of the nanogaps can be easily controlled by adjusting the pressure, heating time, and heating temperature. In addition, 3D multilayer nanostructures and nanocomposites with 2, 3, 5, 7, and 20 layers were fabricated using this method. The fabricated nanogaps with sizes ranging from approximately 1 to 40 nm were observed via high-resolution transmission electron microscopy (HRTEM). The multilayered nanostructures were evaluated using focused ion beam (FIB) technology. Compared with conventional methods, our method could not only easily control the size of the nanogaps on the flexible large-area substrate but could also achieve fast, simple, and cost-effective fabrication of 3D multilayer nanostructures and nanocomposites without any post-treatment. Moreover, a transparent electrode and nanoheater were fabricated and evaluated. Finally, surface-enhanced Raman scattering substrates with different nanogaps were evaluated using rhodamine 6G. In conclusion, it is believed that the proposed method can solve the problems related to the high requirements of nanofabrication and can be applied in the detection of small molecules and for manufacturing flexible electronics and soft actuators.

Molecular crystal lithography: a facile and low-cost approach to fabricate nanogap electrodes.

Graphene and Graphene Oxide Nanogap Electrodes Fabricated by Atomic Force Microscopy Nanolithography

Nanosphere Lithography for Sub-10-Nm Nanogap Electrodes

Nanogap Electrodes: Single Grain Boundary Break Junction for Suspended Nanogap Electrodes with Gapwidth Down to 1–2 nm by Focused Ion Beam Milling (Adv. Mater. 19/2015)

Electrochemical Approach for Fabricating Nanogap Electrodes with Well Controllable Separation

Research progress on fabrication of graphene nanogap electrodes

Molecular Electronics: Nanogap Electrodes Towards Solid State Single‐Molecule Transistors (small 46/2015)

5 nm Nanogap Electrodes and Arrays by a Super-resolution Laser Lithography.

Thermal Induced Single Grain Boundary Break Junction for Suspended Nanogap Electrodes

5 Nm Nanogap Electrodes and Arrays by Super-resolution Laser Lithography.

Large-Area Nanogap-Controlled 3D Nanoarchitectures Fabricated via Layer-by-Layer Nanoimprint

Fabrication of Nanogap Structures Through Spatially Shaped Femtosecond Laser Modification with the Assistance of Wet Chemical Etching.

Nanoscale Electrodes: Nanoscale Electrodes for Flexible Electronics by Swelling Controlled Cracking (adv. Mater. 30/2016).

Lithography-Independent and Large Scale Fabrication of A Metal Electrode Nanogap

Nanogap Electrodes Towards Solid State Single-Molecule Transistors.

Fabrication of Sub-10 Nm Gap by Using Electron Beam Lithography

Nanoscale Electrodes for Flexible Electronics by Swelling Controlled Cracking.

Self-aligned sub-10-nm nanogap electrode array for large-scale integration.

Real Time and in Situ Control of the Gap Size of Nanoelectrodes for Molecular Devices

Sub-5 nm nanogap electrodes towards single-molecular biosensing

Nanogap Electrodes: Nanogap Electrodes (adv. Mater. 2/2010)