Design and Fabrication of A High-Sensitive Capacitive Biaxial Microaccelerometer

Yu Liu,Zhiyu Wen,Zhongquan Wen,Liuqiang Zhang,Hongyun Yang
DOI: https://doi.org/10.1088/0960-1317/17/1/005
2006-01-01
Journal of Micromechanics and Microengineering
Abstract:A high-sensitive capacitive biaxial microaccelerometer using a highly symmetrical microstructure with a single seismic mass and four folded beams is developed. The parameters and characteristics of the sensor are discussed in detail theoretically and numerically. The calculated stiffness in the main axis is about 33.8 N m−1, while the sensitivity is about 458.15 fF g−1. Moreover, the transverse sensitivity is equal to zero, theoretically. Finally, the silicon-on-glass fabrication process and the basic testing results of the device are presented.
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